DocumentCode :
813574
Title :
Measurement of secondary electron emission yields
Author :
Chutopa, Yeelord ; Yotsombat, Banchob ; Brown, Ian G.
Author_Institution :
Dept. of Phys., Chiang Mai Univ., Thailand
Volume :
31
Issue :
5
fYear :
2003
Firstpage :
1095
Lastpage :
1099
Abstract :
The authors describe a method for the measurement of secondary electron emission coefficients and demonstrate the use of this approach for the measurement of secondary electron yields for titanium, copper, and carbon ions incident upon an aluminum target. The method is time-resolved in that a series of measurements can be obtained within a single ion beam pulse of several hundred microseconds duration. The metal ion beams were produced with a vacuum arc ion source, and the ratio of secondary electron current to incident ion current was determined using a Faraday cup with fast control of the electron suppressor voltage. The method is relatively simple and readily applied and is suitable for measurements over a wide parameter range. The secondary yields obtained in the present work are of relevance to the measurement of ion current and implantation dose in plasma immersion ion implantation.
Keywords :
aluminium; carbon; copper; ion sources; plasma immersion ion implantation; secondary electron emission; titanium; vacuum arcs; Al; Al target; C; Cu; Faraday cup; Ti; electron suppressor voltage; ion beam bombardment; ion beam pulse; ion current; ion implantation dose; plasma immersion ion implantation; secondary electron current; secondary electron emission coefficients; secondary yields; time-resolved method; vacuum arc ion source; Aluminum; Carbon dioxide; Copper; Electron beams; Electron emission; Ion beams; Plasma measurements; Pulse measurements; Titanium; Vacuum arcs;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/TPS.2003.818764
Filename :
1240063
Link To Document :
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