DocumentCode :
814498
Title :
High 
-Factor Microrings Using Slightly Etched Rib Waveguides
Author :
Maine, Sylvain ; Marris-morini, Delphine ; Vivien, Laurent ; Cassan, Eric ; Pascal, Daniel ; Laval, Suzanne ; Orobtchouk, Régis ; Han, Bing ; Benyattou, Taha ; Melhaoui, Loubna El ; Fédéli, Jean-Marc
Author_Institution :
Inst. d´´Electron. Fondamentale, Univ. Paris-Sud, Orsay
Volume :
27
Issue :
10
fYear :
2009
fDate :
5/15/2009 12:00:00 AM
Firstpage :
1387
Lastpage :
1391
Abstract :
The paper reports the design, fabrication and characterization of silicon-on-insulator (SOI) microring resonators using shallow etched rib waveguides. The variation of the Q-factor of microring resonators as a function of the ring diameter and coupling gap between the input waveguide and the ring is studied. Such structures are fabricated using e-beam lithography and reactive ion etching steps. Propagation loss of shallow etching rib waveguide has been evaluated to 0.8 dB/cm for wavelengths around 1550 nm. With a ring diameter of 100 mum and a coupling gap of 450 nm, the measured Q -factor is 35300. These results are matched by 3-D numerical optical modeling.
Keywords :
Q-factor; microcavities; optical resonators; optical waveguides; rib waveguides; silicon-on-insulator; sputter etching; Q -factor; coupling gap; e-beam lithography; input waveguide; microrings; reactive ion etching; ring diameter; silicon-on-insulator; slightly etched rib waveguides; Etching; Lithography; Optical device fabrication; Optical resonators; Optical waveguides; Propagation losses; Q measurement; Silicon on insulator technology; Waveguide discontinuities; Wavelength measurement; Silicon-on-insulator substrates (SOIs);
fLanguage :
English
Journal_Title :
Lightwave Technology, Journal of
Publisher :
ieee
ISSN :
0733-8724
Type :
jour
DOI :
10.1109/JLT.2008.923257
Filename :
4909404
Link To Document :
