• DocumentCode
    814611
  • Title

    A high-corrugation-rate self-Processing SiO2--ZrO2 hybrid sol-gel material for fabrication of microlens array

  • Author

    Miao He ; Xiaocong Yuan ; Jing Bu ; Chee Wee Tan

  • Author_Institution
    Photonics Res. Centre, Nanyang Technol. Univ., Singapore, Singapore
  • Volume
    17
  • Issue
    6
  • fYear
    2005
  • fDate
    6/1/2005 12:00:00 AM
  • Firstpage
    1223
  • Lastpage
    1225
  • Abstract
    A novel high-corrugation-rate self-processing SiO2--ZrO2 hybrid sol-gel material has been developed and employed in single-step fabrication of refractive microlens array (MLA). In the proposed process, the SiO2--ZrO2 hybrid sol-gel film was exposed to ultraviolet through a binary mask and directly patterned into an MLA, which could be used as an end product with no further development or etching steps. Measurements showed that the surface relief depth could reach 1.32 μm, equivalent to 17.1% of the sol-gel film thickness. As expected, the fabricated refractive MLA had excellent surface smoothness, structural and dimensional conformity. The discrepancy between the designed and actual focal length of the MLA was 5.3%. The self-processing, being a true single-step method, was shown to be a practical, cost-effective, and promising fabrication technique for microoptical elements.
  • Keywords
    masks; microlenses; optical arrays; optical design techniques; optical fabrication; optical films; optical materials; refractive index; silicon compounds; sol-gel processing; surface topography; thin films; ultraviolet radiation effects; zirconium compounds; 1.32 mum; SiO/sub 2/-ZrO/sub 2/; SiO/sub 2/-ZrO/sub 2/ hybrid material; binary mask; dimensional conformity; direct patterning; etching; focal length; high-corrugation-rate self-processing; hybrid sol-gel film; microlens array; microoptical elements; refractive microlens array; single-step fabrication; sol-gel film thickness; sol-gel material; structural conformity; surface relief depth; surface smoothness; ultraviolet exposure; Etching; Fabrication; Lenses; Microoptics; Optical films; Resists; Substrates; Writing; Zirconium; Microlens array; self-processing; sol-gel;
  • fLanguage
    English
  • Journal_Title
    Photonics Technology Letters, IEEE
  • Publisher
    ieee
  • ISSN
    1041-1135
  • Type

    jour

  • DOI
    10.1109/LPT.2005.846468
  • Filename
    1432783