We design a heterojunction-enhanced n-channel tunneling FET (HE-NTFET) employing a Ge
1−xSn
x/Ge
1−ySn
y (
) heterojunction located in the channel region with a distance of
from the source-channel tunneling junction. We investigate the impact of
on the performance of HE-NTFETs by simulation. HE-NTFETs achieve a positive shift of
, a steeper subthreshold swing (SS), and an enhanced
compared with homo-NTFETs, which is attributed to the modulating effect of heterojunction on band-to-band tunneling (BTBT). At a supply voltage of 0.3 V, 304%
enhancement is demonstrated in the Ge
0.92Sn
0.08/Ge
0.94Sn
0.06 HE-NTFET with a 4 nm
over Ge
0.92Sn
0.08 homo-NTFET due to the steeper average SS. The impact of Sn composition on the performance of HE-NTFETs is also studied. As we increase the difference in Sn composition
across the heterojunction,
and SS of HE-NTFETs are improved due to the increase in band offsets at the Ge
1−xSnx/Ge1−ySny interface, which leads to the enhanced modulating effect of heterojunction on BTBT.