Title :
A General Harmonic Rule Controller for Run-to-Run Process Control
Author :
He, Fangyi ; Wang, Kaibo ; Jiang, Wei
Author_Institution :
Sch. of Syst. & Enterprises, Stevens Inst. of Technol., Hoboken, NJ
fDate :
5/1/2009 12:00:00 AM
Abstract :
The existence of initial bias in parameter estimation is an important issue in controlling short-run processes in semiconductor manufacturing. Harmonic rule has been widely used in machine setup adjustment problems. This paper generalizes the harmonic rule to a new controller called general harmonic rule (GHR) controller in run-to-run process control. The stability and optimality of the GHR controller is discussed for a wide range of stochastic disturbances. A numerical study is performed to compare the sensitivity of the GHR controller, the exponentially weighted moving average (EWMA) controller and the variable EWMA controller. It is shown that the GHR controller is more robust than the EWMA controller when the process parameters are estimated with uncertainty.
Keywords :
process control; semiconductor device manufacture; stochastic processes; exponentially weighted moving average controller; general harmonic rule controller; machine setup adjustment problems; parameter estimation; run-to-run process control; semiconductor manufacturing; short-run processes; stochastic disturbances; Manufacturing processes; Optimal control; Parameter estimation; Process control; Robust control; Semiconductor device manufacture; Stability; Stochastic processes; Uncertainty; Weight control; Automatic process control; EWMA; robust control; worst case;
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
DOI :
10.1109/TSM.2009.2017627