DocumentCode :
815856
Title :
Strength and symmetry of the third-order nonlinearity during poling of glass waveguides
Author :
Marckmann, Carl J. ; Ren, Yitao ; Genty, Goëry ; Kristensen, Martin
Author_Institution :
COM, Tech. Univ. Denmark, Lyngby, Denmark
Volume :
14
Issue :
9
fYear :
2002
Firstpage :
1294
Lastpage :
1296
Abstract :
Negative thermal poling introduces second-order nonlinear effects into silica glass. The effects are studied using the charge separation model allowing for the third-order nonlinear effect to be anisotropic. The second-order nonlinear coefficient /spl chi//sup (2)/ is found to be consistent with the results reported previously by Arentoft et al. (1999), Ren et al. (2002), and Marckmann et al. (2001) and the third-order nonlinear coefficient /spl chi//sup (3)/ is found to be anisotropic but constant during poling.
Keywords :
Bragg gratings; Kerr electro-optical effect; Pockels effect; dielectric polarisation; nonlinear optical susceptibility; optical fabrication; optical glass; optical planar waveguides; ultraviolet radiation effects; Bragg gratings; Gaussian functions; Pockels effect; UV poling; buffer layer; charge separation model; cladding layer; core layer; electrooptic Kerr effect; negative thermal poling; optimal poling conditions; second-order nonlinear coefficient; silica glass waveguides; third-order nonlinear effect; transmission spectra; Anisotropic magnetoresistance; Annealing; Dielectric measurements; Doping; Electrooptic devices; Germanium; Glass; Nitrogen; Silicon compounds; Wavelength measurement;
fLanguage :
English
Journal_Title :
Photonics Technology Letters, IEEE
Publisher :
ieee
ISSN :
1041-1135
Type :
jour
DOI :
10.1109/LPT.2002.801595
Filename :
1032358
Link To Document :
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