DocumentCode
816059
Title
Markov model for threshold-voltage shift in amorphous silicon TFTs for variable gate bias
Author
Sambandan, Sanjiv ; Zhu, Lei ; Striakhilev, Denis ; Servati, Peyman ; Nathan, Arokia
Author_Institution
Dept. of Electr. & Comput. Eng., Univ. of Waterloo, Ont., Canada
Volume
26
Issue
6
fYear
2005
fDate
6/1/2005 12:00:00 AM
Firstpage
375
Lastpage
377
Abstract
Amorphous silicon (a-Si:H) thin-film transistors (TFTs) are widely used in active matrix displays and sensors, in which their operation is typically analog in nature. However, the TFT experiences a VT shift with time under gate bias, and the need for a model of the VT shift with variable gate bias is imperative for robust circuit design. A model for the VT shift under constant and variable gate bias has been presented and agrees with measurement results. The developed model can be easily represented by circuit elements and incorporated into a circuit simulator. As a proof of concept, we use the model to predict the transients of a weighted voltage subtractor circuit.
Keywords
Markov processes; amorphous semiconductors; semiconductor device models; silicon compounds; thin film transistors; Markov model; Si:H; VT shift model; a-Si:H thin-film transistors; amorphous silicon TFT; amorphous silicon thin-film transistors; constant gate bias; threshold-voltage shift; variable gate bias; Amorphous silicon; Circuit simulation; Displays; Fabrication; Predictive models; Robustness; Stress; Temperature sensors; Thin film transistors; Threshold voltage; Analog circuit; thin-film transistors (TFTs); threshold voltage shift;
fLanguage
English
Journal_Title
Electron Device Letters, IEEE
Publisher
ieee
ISSN
0741-3106
Type
jour
DOI
10.1109/LED.2005.848116
Filename
1432904
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