• DocumentCode
    816059
  • Title

    Markov model for threshold-voltage shift in amorphous silicon TFTs for variable gate bias

  • Author

    Sambandan, Sanjiv ; Zhu, Lei ; Striakhilev, Denis ; Servati, Peyman ; Nathan, Arokia

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Univ. of Waterloo, Ont., Canada
  • Volume
    26
  • Issue
    6
  • fYear
    2005
  • fDate
    6/1/2005 12:00:00 AM
  • Firstpage
    375
  • Lastpage
    377
  • Abstract
    Amorphous silicon (a-Si:H) thin-film transistors (TFTs) are widely used in active matrix displays and sensors, in which their operation is typically analog in nature. However, the TFT experiences a VT shift with time under gate bias, and the need for a model of the VT shift with variable gate bias is imperative for robust circuit design. A model for the VT shift under constant and variable gate bias has been presented and agrees with measurement results. The developed model can be easily represented by circuit elements and incorporated into a circuit simulator. As a proof of concept, we use the model to predict the transients of a weighted voltage subtractor circuit.
  • Keywords
    Markov processes; amorphous semiconductors; semiconductor device models; silicon compounds; thin film transistors; Markov model; Si:H; VT shift model; a-Si:H thin-film transistors; amorphous silicon TFT; amorphous silicon thin-film transistors; constant gate bias; threshold-voltage shift; variable gate bias; Amorphous silicon; Circuit simulation; Displays; Fabrication; Predictive models; Robustness; Stress; Temperature sensors; Thin film transistors; Threshold voltage; Analog circuit; thin-film transistors (TFTs); threshold voltage shift;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2005.848116
  • Filename
    1432904