DocumentCode :
816059
Title :
Markov model for threshold-voltage shift in amorphous silicon TFTs for variable gate bias
Author :
Sambandan, Sanjiv ; Zhu, Lei ; Striakhilev, Denis ; Servati, Peyman ; Nathan, Arokia
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Waterloo, Ont., Canada
Volume :
26
Issue :
6
fYear :
2005
fDate :
6/1/2005 12:00:00 AM
Firstpage :
375
Lastpage :
377
Abstract :
Amorphous silicon (a-Si:H) thin-film transistors (TFTs) are widely used in active matrix displays and sensors, in which their operation is typically analog in nature. However, the TFT experiences a VT shift with time under gate bias, and the need for a model of the VT shift with variable gate bias is imperative for robust circuit design. A model for the VT shift under constant and variable gate bias has been presented and agrees with measurement results. The developed model can be easily represented by circuit elements and incorporated into a circuit simulator. As a proof of concept, we use the model to predict the transients of a weighted voltage subtractor circuit.
Keywords :
Markov processes; amorphous semiconductors; semiconductor device models; silicon compounds; thin film transistors; Markov model; Si:H; VT shift model; a-Si:H thin-film transistors; amorphous silicon TFT; amorphous silicon thin-film transistors; constant gate bias; threshold-voltage shift; variable gate bias; Amorphous silicon; Circuit simulation; Displays; Fabrication; Predictive models; Robustness; Stress; Temperature sensors; Thin film transistors; Threshold voltage; Analog circuit; thin-film transistors (TFTs); threshold voltage shift;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2005.848116
Filename :
1432904
Link To Document :
بازگشت