Influence of Surface Roughness on the Lasing Performance of Highly Disordered ZnO Films

Author

Abiyasa, A.P. ; Yu, S.F. ; Yuen, Clement ; Lau, S.P.

Author_Institution

Sch. of Electr. & Electron. Eng., Nanyang Technol. Univ.

Volume

18

Issue

22

fYear

2006

Firstpage

2380

Lastpage

2382

Abstract

The influence of surface roughness on the lasing performance of highly disordered ZnO films is studied. It is found that the highly disordered ZnO films with improvement in surface quality by ion-beam milling can significantly reduce the corresponding scattering loss as well as increase the slope efficiency of the light-light curves even with the presence of MgO cladding layer. Furthermore, it is noted that random lasing action is less dependent on the surface roughness of the ZnO films

Keywords

II-VI semiconductors; ion beam applications; milling; optical films; random processes; semiconductor lasers; semiconductor thin films; surface roughness; wide band gap semiconductors; zinc compounds; ZnO; highly disordered ZnO films; ion-beam milling; random lasing; scattering loss; slope efficiency; surface roughness; Light scattering; Milling; Optical films; Optical filters; Optical scattering; Rough surfaces; Semiconductor films; Semiconductor lasers; Surface roughness; Zinc oxide; Random lasing; ultraviolet emission; zinc oxide;

fLanguage

English

Journal_Title

Photonics Technology Letters, IEEE

Publisher

ieee

ISSN

1041-1135

Type

jour

DOI

10.1109/LPT.2006.885616

Filename

4012053