High-accuracy characterization of titanium films for LiNbO/sub 3/ guided wave devices by optical densitometry

Author

Meneghini, G. ; Meliga, M. ; De Bernardi, C. ; Morasca, S. ; Carnera, A.

Author_Institution

Centro Studi e Lab. Telecommun. SpA, Turin, Italy

Volume

7

Issue

2

fYear

1989

Firstpage

250

Lastpage

254

Abstract

An experimental study of optical densitometry as a technique for accurate determination of Ti film thickness for integrated optical devices on LiNbO/sub 3/ is discussed. Densitometric data, obtained with a simple instrument for photographic applications, are compared to conventional stylus profilometric measurements and to microgravimetric and Rutherford backscatter measurements; excellent linearity and a sensitivity of about 3 AA are evidenced, as well as capability of absolute calibration in terms of metal atoms per unit surface area, over the entire range of Ti thickness commonly used in integrated optics. The possibility of using this very simple, rapid, and nondestructive method for systematic sample testing, online deposition monitoring, and utilizing optimum coating area is also presented.<>

Keywords

densitometry; integrated optics; metallic thin films; thickness measurement; titanium; LiNbO/sub 3/ guided wave devices; Rutherford backscatter measurements; Ti films; calibration; coating; deposition monitoring; film thickness measurement; integrated optical devices; microgravimetric measurements; nondestructive testing; optical densitometry; photographic applications; sensitivity; stylus profilometric measurements; Area measurement; Atomic measurements; Density measurement; Instruments; Integrated optics; Optical devices; Optical films; Optical sensors; Thickness measurement; Titanium;

fLanguage

English

Journal_Title

Lightwave Technology, Journal of

Publisher

ieee

ISSN

0733-8724

Type

jour

DOI

10.1109/50.17763

Filename

17763