DocumentCode
816557
Title
Effects of ionizing radiation on the noise properties of DMOS power transistors
Author
Babcock, J.A. ; Titus, J.L. ; Schrimpf, R.D. ; Galloway, K.F.
Volume
38
Issue
6
fYear
1991
fDate
12/1/1991 12:00:00 AM
Firstpage
1304
Lastpage
1309
Abstract
The 1/f noise properties of DMOS (double-diffused MOS) power transistors were examined as a function of total ionizing dose. The results indicate that radiation causes significant changes in the frequency dependence of the noise of the power MOSFETs studied. Before exposure to radiation, the noise power spectral density indicated a 1/ f λ relationship where λ ranged from approximately 0.5 to 1.0. As the total dose level increased. λ approached unity, while the magnitude of the noise increased proportionally with the radiation-induced charge density. In addition, noise measurements were performed after irradiation, while the devices were annealing under a ±12 V bias. It was found that, under the +12 V bias, λ increased and under the -12 V bias, λ decreased. Finally, no correlation was found between the pre-irradiation 1/f noise magnitude and the radiation hardness of these DMOS power transistors
Keywords
annealing; electron device noise; insulated gate field effect transistors; power transistors; radiation effects; radiation hardening (electronics); 1/f noise properties; DMOS power transistors; annealing; ionizing radiation effects; noise measurements; noise properties; power MOSFETs; radiation hardness; radiation-induced charge density; total ionizing dose; Annealing; Degradation; Ionizing radiation; Low-frequency noise; MOSFETs; Noise measurement; Power transistors; Semiconductor device noise; Weapons; Working environment noise;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/23.124109
Filename
124109
Link To Document