• DocumentCode
    816557
  • Title

    Effects of ionizing radiation on the noise properties of DMOS power transistors

  • Author

    Babcock, J.A. ; Titus, J.L. ; Schrimpf, R.D. ; Galloway, K.F.

  • Volume
    38
  • Issue
    6
  • fYear
    1991
  • fDate
    12/1/1991 12:00:00 AM
  • Firstpage
    1304
  • Lastpage
    1309
  • Abstract
    The 1/f noise properties of DMOS (double-diffused MOS) power transistors were examined as a function of total ionizing dose. The results indicate that radiation causes significant changes in the frequency dependence of the noise of the power MOSFETs studied. Before exposure to radiation, the noise power spectral density indicated a 1/ fλ relationship where λ ranged from approximately 0.5 to 1.0. As the total dose level increased. λ approached unity, while the magnitude of the noise increased proportionally with the radiation-induced charge density. In addition, noise measurements were performed after irradiation, while the devices were annealing under a ±12 V bias. It was found that, under the +12 V bias, λ increased and under the -12 V bias, λ decreased. Finally, no correlation was found between the pre-irradiation 1/f noise magnitude and the radiation hardness of these DMOS power transistors
  • Keywords
    annealing; electron device noise; insulated gate field effect transistors; power transistors; radiation effects; radiation hardening (electronics); 1/f noise properties; DMOS power transistors; annealing; ionizing radiation effects; noise measurements; noise properties; power MOSFETs; radiation hardness; radiation-induced charge density; total ionizing dose; Annealing; Degradation; Ionizing radiation; Low-frequency noise; MOSFETs; Noise measurement; Power transistors; Semiconductor device noise; Weapons; Working environment noise;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/23.124109
  • Filename
    124109