DocumentCode :
81710
Title :
Phenomenon of Drain Current Instability on p-GaN Gate AlGaN/GaN HEMTs
Author :
Ting-Fu Chang ; Tsung-Chieh Hsiao ; Chih-Fang Huang ; Wei-Hung Kuo ; Suh-Fang Lin ; Samudra, Ganesh S. ; Liang, Yung C.
Author_Institution :
Inst. of Electron. Eng., Nat. Tsing Hua Univ., Hsinchu, Taiwan
Volume :
62
Issue :
2
fYear :
2015
fDate :
Feb. 2015
Firstpage :
339
Lastpage :
345
Abstract :
In this paper, an observation of drain current instability on p-GaN gate AlGaN/GaN HEMTs is reported. Contrary to the Schottky gate AlGaN/GaN HEMTs, which show stable and consistent Id-Vd curves under different pulsed conditions, the Id-Vd curves for p-GaN gate AlGaN/GaN HEMTs show a dispersion in the saturation region under the same pulse conditions, which cannot be explained by the trapping of electrons in the material. A model considering the trapping of holes in the p-GaN gate under different gate and drain biases is proposed to explain this new phenomenon.
Keywords :
III-V semiconductors; aluminium compounds; gallium compounds; high electron mobility transistors; semiconductor device models; wide band gap semiconductors; AlGaN-GaN; drain current instability; gate HEMT; saturation region; Aluminum gallium nitride; Current measurement; Gallium nitride; HEMTs; Logic gates; MODFETs; Voltage measurement; AlGaN/GaN; HEMT; high voltage; instability; p-GaN gate;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2014.2352276
Filename :
6907990
Link To Document :
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