DocumentCode :
81738
Title :
Occurrence of Resistive Switching and Threshold Switching in Atomic Layer Deposited Ultrathin (2 nm) Aluminium Oxide Crossbar Resistive Random Access Memory
Author :
Banerjee, Writam ; Xiaoxin Xu ; Hongtao Liu ; Hangbing Lv ; Qi Liu ; Haitao Sun ; Shibing Long ; Ming Liu
Author_Institution :
Lab. of Nanofabrication & Novel Device Integration, Inst. of Microelectron., Beijing, China
Volume :
36
Issue :
4
fYear :
2015
fDate :
Apr-15
Firstpage :
333
Lastpage :
335
Abstract :
Resistive random access memory (RRAM) is a promising emerging nonvolatile memory which offer high density integration in the form of cross-bar array design. Selector devices are a vital requirement to suppress the cross-talk issue. In this letter, we are going to demonstrate the coexistence of resistive switching (RS) and threshold switching (TS) in an ultrathin 2-nm Aluminium oxide (AlOx)-based crossbar RRAM devices. Depending on current level the device itself can switch from TS to RS mode with a nonlinearity of > 102. Stable TS of > 103 cycles has been achieved at 10 nA. Achievements of this letter offers the usability of 2-nm AlOx RRAM devices as a selector and as a memory device for high density crossbar array integration.
Keywords :
aluminium compounds; atomic layer deposition; resistive RAM; switching circuits; AlOx; RRAM device; RS; TS; atomic layer deposited ultrathin aluminium oxide crossbar array design; cross-talk suppression; current 10 nA; nonvolatile memory; resistive random access memory; resistive switching; size 2 nm; threshold switching; Atomic layer deposition; Electron traps; Resistance; Switches; Tin; Tunneling; AlOx; RRAM; cross-bar; current compliance; threshold switching;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2015.2407361
Filename :
7050348
Link To Document :
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