• DocumentCode
    81738
  • Title

    Occurrence of Resistive Switching and Threshold Switching in Atomic Layer Deposited Ultrathin (2 nm) Aluminium Oxide Crossbar Resistive Random Access Memory

  • Author

    Banerjee, Writam ; Xiaoxin Xu ; Hongtao Liu ; Hangbing Lv ; Qi Liu ; Haitao Sun ; Shibing Long ; Ming Liu

  • Author_Institution
    Lab. of Nanofabrication & Novel Device Integration, Inst. of Microelectron., Beijing, China
  • Volume
    36
  • Issue
    4
  • fYear
    2015
  • fDate
    Apr-15
  • Firstpage
    333
  • Lastpage
    335
  • Abstract
    Resistive random access memory (RRAM) is a promising emerging nonvolatile memory which offer high density integration in the form of cross-bar array design. Selector devices are a vital requirement to suppress the cross-talk issue. In this letter, we are going to demonstrate the coexistence of resistive switching (RS) and threshold switching (TS) in an ultrathin 2-nm Aluminium oxide (AlOx)-based crossbar RRAM devices. Depending on current level the device itself can switch from TS to RS mode with a nonlinearity of > 102. Stable TS of > 103 cycles has been achieved at 10 nA. Achievements of this letter offers the usability of 2-nm AlOx RRAM devices as a selector and as a memory device for high density crossbar array integration.
  • Keywords
    aluminium compounds; atomic layer deposition; resistive RAM; switching circuits; AlOx; RRAM device; RS; TS; atomic layer deposited ultrathin aluminium oxide crossbar array design; cross-talk suppression; current 10 nA; nonvolatile memory; resistive random access memory; resistive switching; size 2 nm; threshold switching; Atomic layer deposition; Electron traps; Resistance; Switches; Tin; Tunneling; AlOx; RRAM; cross-bar; current compliance; threshold switching;
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2015.2407361
  • Filename
    7050348