Title :
Proton-induced damage in gallium nitride-based Schottky diodes
Author :
Karmarkar, Aditya P. ; White, Brad D. ; Buttari, Dario ; Fleetwood, Daniel M. ; Schrimpf, Ronald D. ; Weller, Robert A. ; Brillson, Leonard J. ; Mishra, Umesh K.
Author_Institution :
Interdisciplinary Program in Mater. Sci., Vanderbilt Univ., Nashville, TN, USA
Abstract :
Proton irradiation decreases the doping concentration and increases the ideality factor and series resistance, but has very little effect on the Schottky barrier height in n-Gallium nitride Schottky diodes. 1.0-MeV protons cause greater degradation than 1.8-MeV protons because of their higher nonionizing energy loss. The displacement damage recovers during annealing. Comparison between Schottky diodes and high electron-mobility transistors suggests that the degradation in both types of devices is predominantly due to carrier removal and mobility degradation caused by radiation-induced defect centers in the crystal lattice, with interface disorder playing a relatively insignificant part in overall device degradation.
Keywords :
III-V semiconductors; Schottky barriers; Schottky diodes; annealing; colour centres; crystal structure; electrical resistivity; electron mobility; gallium compounds; proton effects; semiconductor doping; wide band gap semiconductors; GaN; Schottky barrier height; annealing; carrier removal; crystal lattice; device degradation; displacement damage; doping concentration; high electron-mobility transistors; higher nonionizing energy loss; interface disorder; mobility degradation; n-gallium nitride Schottky diodes; proton irradiation; radiation-induced defect centers; series resistance; Annealing; Degradation; Doping; Energy loss; Gallium nitride; HEMTs; III-V semiconductor materials; Protons; Schottky barriers; Schottky diodes; Gallium (Ga) alloys; Schottky diodes; proton radiation effects;
Journal_Title :
Nuclear Science, IEEE Transactions on
DOI :
10.1109/TNS.2005.860668