Planar Concave Grating Demultiplexer Fabricated on a Nanophotonic Silicon-on-Insulator Platform

Author

Brouckaert, Joost ; Bogaerts, Wim ; Dumon, Pieter ; Thourhout, Dries Van ; Baets, Roel

Author_Institution

Dept. of Inf. Technol., Univ. Gent

Volume

25

Issue

5

fYear

2007

fDate

5/1/2007 12:00:00 AM

Firstpage

1269

Lastpage

1275

Abstract

We show that a nanophotonic silicon-on-insulator (SOI) platform offers many advantages for the implementation of planar concave grating (PCG) demultiplexers, as compared with other material systems. We present for the first time the design and measurement results of a PCG demultiplexer fabricated on a nanophotonic SOI platform using standard wafer scale CMOS processes including deep-UV lithography. Our PCG device has four wavelength channels with a channel spacing of 20 nm and a record-small footprint of 280times150 mum. The on-chip loss is 7.5 dB, and the crosstalk is better than -30 dB

Keywords

channel spacing; demultiplexing equipment; diffraction gratings; micro-optics; nanolithography; optical crosstalk; optical design techniques; optical fabrication; optical losses; silicon-on-insulator; ultraviolet lithography; 7.5 dB; channel spacing; crosstalk; deep-UV lithography; nanophotonic silicon-on-insulator platform; on-chip loss; planar concave grating demultiplexer; standard wafer scale CMOS process; Arrayed waveguide gratings; CMOS process; Crosstalk; Etching; Insertion loss; Lithography; Optical losses; Photonics; Refractive index; Silicon on insulator technology; Demultiplexing; diffraction; gratings; nanophotonics; silicon-on-insulator (SOI);

fLanguage

English

Journal_Title

Lightwave Technology, Journal of

Publisher

ieee

ISSN

0733-8724

Type

jour

DOI

10.1109/JLT.2007.893025

Filename

4167948