A Novel Optimization Method for Parametric Yield: Uniform Design Mapping Distance Algorithm

Author

Jing, Ming-e ; Hao, Yue ; Zhou, Dian ; Zeng, Xuan

Author_Institution

Microelectron. Dept., Fudan Univ., Shanghai

Volume

26

Issue

6

fYear

2007

fDate

6/1/2007 12:00:00 AM

Firstpage

1149

Lastpage

1155

Abstract

A novel algorithm UDMDA for parametric yield optimization of IC is proposed in this paper. The algorithm integrates uniform design (UD) and mapping distance. An effective yet simple measurement of uniformity of a set of points, namely k-nearest neighbor, is suggested in the UD. Compared with the available methods, the proposed algorithm does not need any calculation of gradient and assumption of initial point. Furthermore, this algorithm has a high convergence rate and is not sensitive to the size of circuit. Therefore, it can be utilized to optimize the nominal performance as well as improve parametric yield. The efficiency of this algorithm is illustrated with two circuit examples

Keywords

circuit optimisation; integrated circuit layout; integrated circuit yield; integrated circuit optimization; k-nearest neighbor; parametric yield optimization method; uniform design mapping distance algorithm; uniformity measurement; Algorithm design and analysis; Circuits; Convergence; Design optimization; Educational programs; Manufacturing; Microelectronics; Optimization methods; Very large scale integration; Yield estimation; Integrated circuits; mapping distance (MD); uniform design (UD); yield optimization;

fLanguage

English

Journal_Title

Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on

Publisher

ieee

ISSN

0278-0070

Type

jour

DOI

10.1109/TCAD.2006.885833

Filename

4167986