Preparation and some properties of sputtered Co/U-As multilayers

Author

Plaskett, T.S. ; Fumagalli, P. ; McGuire, T.R. ; Gambino, R.J. ; Bojarczuk, N.A. ; Angilello, J.

Author_Institution

IBM Thomas J. Watson Res. Center, Yorktown Heights, NY, USA

Volume

28

Issue

5

fYear

1992

fDate

9/1/1992 12:00:00 AM

Firstpage

2659

Lastpage

2661

Abstract

Multilayers of crystalline Co and amorphous U-As were prepared by magnetron sputtering. The number of Co/U-As bilayers varied from 30 to 170. The magnetooptical, magneto-transport, and magnetic properties are reported for Co layer thickness varying from 2 to 10 Å and U-As from 5 to 30 Å. The properties of the multilayer films are different from the properties of films of U-As, Co and an U-As-Co alloy. Some exchange coupling between the Co and U-As at 300 K is observed from polar Kerr measurements for films with U-As layers 20 Å and thicker

Keywords

Hall effect; Kerr magneto-optical effect; cobalt; coercive force; exchange interactions (electron); magnetic moments; magnetic multilayers; magnetoresistance; sputter deposition; uranium compounds; 2 to 10 Å; 5 to 30 Å; Hall effect; amorphous U-As; coercive field; exchange coupling; magnetic properties; magnetooptical properties; magnetoresistance; magnetron sputtering; polar Kerr measurements; saturated magnetic moments; sputtered Co-VAs multilayers; Amorphous magnetic materials; Amorphous materials; Cobalt alloys; Crystallization; Magnetic films; Magnetic multilayers; Magnetic properties; Nonhomogeneous media; Sputtering; Thickness measurement;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.179588

Filename

179588