Structural and magnetoresistance properties of Co/Cu multilayers

Author

Tomlinson, M.E. ; Pollard, R.J. ; Lord, D.G. ; Grundy, P.J. ; Chun, Zhao

Author_Institution

Dept. of Pure & Appl. Phys., Salford Univ., UK

Volume

28

Issue

5

fYear

1992

fDate

9/1/1992 12:00:00 AM

Firstpage

2662

Lastpage

2664

Abstract

The structure and magnetoresistance of Co/Cu multilayers prepared by magnetron sputtering in a high vacuum deposition system have been investigated. It is shown that sputter-deposited Co/Cu multilayers can exhibit the giant magnetoresistive effect. The magnetoresistance depends on the microstructure of the multilayer, and for structures grown on glass the presence of a suitable buffer layer can considerably increase the observed effect. Measurement on as-deposited and annealed multilayers show that a large effect is associated with smoother rather than rougher interfaces, at least in the scale of roughness in the present multilayers and with a small grain size

Keywords

X-ray diffraction examination of materials; annealing; cobalt; copper; magnetic multilayers; magnetoresistance; sputtered coatings; surface topography; Co-Cu multilayers; X-ray diffraction; annealed multilayers; buffer layer; giant magnetoresistive effect; high vacuum deposition system; interface roughness; magnetoresistance; magnetron sputtering; microstructure; Annealing; Buffer layers; Giant magnetoresistance; Glass; Magnetic multilayers; Magnetic properties; Microstructure; Size measurement; Sputtering; Vacuum systems;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.179589

Filename

179589