DocumentCode :
821195
Title :
Monte Carlo Analysis of Dose Profiles near Photon Irradiated Material Interfaces
Author :
Garth, J.C. ; Chadsey, W.L. ; Sheppard, R.L., Jr.
Author_Institution :
Air Force Cambridge Research Laboratories Bedford, Massachusetts
Volume :
22
Issue :
6
fYear :
1975
Firstpage :
2562
Lastpage :
2567
Abstract :
Dose profiles in silicon and polyethylene next to gold-silicon and gold-polyethylene interfaces, due to x-rays of energies between 10 and 2000 keV, have been calculated using the POEM Monte Carlo electron transport code. By calculating separately the transport of Compton, K-, M-and L-photoelectric, and Auger electrons generated in the gold, each contribution to the total energy fluence profile was obtained and fit to the functional form A exp (Bx+Cx2+Dx3). Differentiating this form and summing over all source contributions led to excellent analytic representations of the dose profile next to gold for energies below 200 keV. Above 200 keV the dose profiles for two directions of photon irradiation were obtained by the method of Chadsey. Curves of relative dose and relative mean dose as a function of x-ray energy for several distances from the interface were calculated for the first time.
Keywords :
Backscatter; Electron emission; Gold; Laboratories; Monte Carlo methods; Photonics; Polyethylene; Production; Silicon; X-rays;
fLanguage :
English
Journal_Title :
Nuclear Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9499
Type :
jour
DOI :
10.1109/TNS.1975.4328168
Filename :
4328168
Link To Document :
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