DocumentCode :
821360
Title :
MCVD planar substrates for UV-written waveguide devices
Author :
Webb, A.S. ; Adikan, F. R Mahamd ; Sahu, J.K. ; Standish, R.J. ; Gawith, C.B.E. ; Gates, J.C. ; Smith, P.G.R. ; Payne, D.N.
Author_Institution :
Optoelectronics Res. Centre, Univ. of Southampton
Volume :
43
Issue :
9
fYear :
2007
Firstpage :
517
Lastpage :
519
Abstract :
A method for fabricating planar silica substrates via modified chemical vapour deposition (MCVD) and a modified fibre drawing technique is presented. Long lengths of planar material are generated from a single substrate offering a potentially low-cost alternative to existing planar substrate deposition processes. Buried straight and splitting waveguide channels, as well as Bragg gratings, are inscribed in the planar material using direct UV-writing technology, and the results are reported
Keywords :
Bragg gratings; chemical vapour deposition; drawing (mechanical); optical beam splitters; optical fabrication; optical planar waveguides; silicon compounds; substrates; Bragg gratings; MCVD planar substrates; SiO2; UV-written waveguide devices; buried channel waveguides; modified chemical vapour deposition; modified fibre drawing technique; optical fibre; planar silica substrates; splitting waveguide channels; straight waveguide channels;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:20070281
Filename :
4168491
Link To Document :
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