• DocumentCode
    821360
  • Title

    MCVD planar substrates for UV-written waveguide devices

  • Author

    Webb, A.S. ; Adikan, F. R Mahamd ; Sahu, J.K. ; Standish, R.J. ; Gawith, C.B.E. ; Gates, J.C. ; Smith, P.G.R. ; Payne, D.N.

  • Author_Institution
    Optoelectronics Res. Centre, Univ. of Southampton
  • Volume
    43
  • Issue
    9
  • fYear
    2007
  • Firstpage
    517
  • Lastpage
    519
  • Abstract
    A method for fabricating planar silica substrates via modified chemical vapour deposition (MCVD) and a modified fibre drawing technique is presented. Long lengths of planar material are generated from a single substrate offering a potentially low-cost alternative to existing planar substrate deposition processes. Buried straight and splitting waveguide channels, as well as Bragg gratings, are inscribed in the planar material using direct UV-writing technology, and the results are reported
  • Keywords
    Bragg gratings; chemical vapour deposition; drawing (mechanical); optical beam splitters; optical fabrication; optical planar waveguides; silicon compounds; substrates; Bragg gratings; MCVD planar substrates; SiO2; UV-written waveguide devices; buried channel waveguides; modified chemical vapour deposition; modified fibre drawing technique; optical fibre; planar silica substrates; splitting waveguide channels; straight waveguide channels;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:20070281
  • Filename
    4168491
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=821360