Title :
A low-loss silicon-on-silicon DC-110-GHz resonance-free package
Author :
Min, Byung-Wook ; Rebeiz, Gabriel M.
Author_Institution :
Electr. Eng. & Comput. Sci. Dept., Univ. of Michigan, Ann Arbor, MI, USA
Abstract :
This paper reports on the design and fabrication of a hermetic-compatible wafer-scale package for microwave and millimeter-wave devices. Coplanar waveguide (CPW) lines on a high-resistivity silicon wafer are covered with another silicon wafer using gold-to-gold thermo-compression bonding. Oxide is used as a dielectric inter-layer for CPW feed-throughs underneath the gold sealing ring. A 130-μm-high cavity is etched in the cap wafer to remove an impact of capping wafer on CPW lines or RF devices. The designed feed-through has an insertion loss of 0.05-0.26 dB at dc-110 GHz with a return loss of <-20 dB (per transition). The gold sealing ring is connected to the CPW ground to eliminate any parasitic resonance and leakage of the package. The whole packaged CPW line has a measured insertion loss of 0.2-0.7 dB and return loss of <-20 dB at dc-110 GHz.
Keywords :
coplanar waveguides; electronics packaging; hermetic seals; microwave devices; millimetre wave devices; silicon; 110 GHz; 130 micron; CPW feed-throughs; CPW lines; RF microelectromechanical systems; Si; coplanar waveguide lines; gold-to-gold thermo-compression bonding; hermetic-compatible wafer-scale package; high-resistivity silicon wafer; low-loss silicon-on-silicon resonance-free package; microwave devices; millimeter-wave devices; oxide dielectric inter-layer; package leakage; package transition; parasitic resonance; silicon micromachining; wafer bonding; Coplanar waveguides; Fabrication; Gold; Insertion loss; Microwave devices; Millimeter wave devices; Packaging; Resonance; Silicon; Wafer bonding; Hermetic package; RF microelectromechanical systems (MEMS); package leakage; package transition; parasitic resonance; silicon micromachining; wafer bonding; wafer-scale packaging;
Journal_Title :
Microwave Theory and Techniques, IEEE Transactions on
DOI :
10.1109/TMTT.2005.862655