Preparation of soft magnetic Fe-N films by ion beam deposition method with strict control of plasma potential

Author

Nakagawa, Shigeki ; Hamaguchi, Takehiko ; Naoe, Masahiko

Author_Institution

Dept. of Phys. Electron., Tokyo Inst. of Technol., Japan

Volume

28

Issue

5

fYear

1992

fDate

9/1/1992 12:00:00 AM

Firstpage

2946

Lastpage

2948

Abstract

An ion beam deposition apparatus with the facing targets type of ion source (FTIS) was used to deposit ion species with proper kinetic energy and particularly to prepare soft magnetic Fe-N films. The coercivity was varied by strict control of the nitration degree of Fe-N films by adjusting the NH₃ partial pressure. The H _c and the relative permeability μ_r could be controlled by adjusting the plasma potential V_p. Further improvement of soft magnetic properties of the films, such as decrease of H_c and increase of μ_r, has been attained by a post-annealing process. For example, Fe-N films prepared at P_NH3 of 8 mPa and V_p of 45 V and postannealed at 150°C exhibited 4 πM_s, H_c, and μ_r of 19 kG, 2 Oe, and 2000, respectively. Consequently, the Fe-N films prepared by FTIS may be useful as the magnetic core layer for a thin-film-type recording head with high performance

Keywords

annealing; coercive force; ferromagnetic properties of substances; iron alloys; magnetic hysteresis; magnetic permeability; magnetic thin films; sputter deposition; sputtered coatings; coercivity; facing targets ion source; film preparation; ion beam deposition method; magnetic core layer; plasma potential; post-annealing; relative permeability; soft magnetic Fe-N films; soft magnetic properties; thin-film-type recording head; Coercive force; Ion beams; Ion sources; Kinetic energy; Magnetic films; Magnetic properties; Permeability; Plasma properties; Pressure control; Soft magnetic materials;

fLanguage

English

Journal_Title

Magnetics, IEEE Transactions on

Publisher

ieee

ISSN

0018-9464

Type

jour

DOI

10.1109/20.179681

Filename

179681