DocumentCode :
822358
Title :
Influence of Elastic and Inelastic Phonon Scattering on the Drive Current of Quasi-Ballistic MOSFETs
Author :
Tsuchiya, Hideaki ; Takagi, Shin-ichi
Author_Institution :
Grad. Sch. of Eng., Kobe Univ., Kobe
Volume :
55
Issue :
9
fYear :
2008
Firstpage :
2397
Lastpage :
2402
Abstract :
In this paper, we study the influence of elastic and inelastic phonon scattering on the drive current of Si MOSFETs under quasi-ballistic transport. Inelastic phonon emission involving energy relaxation helps achieve ballistic current, even in the presence of scattering, if the channel length is scaled down to the 10-nm scale. This result agrees with Natori´s previous predictions. However, for longer channel devices, inelastic phonon emission degrades the drain current due to space charge effects caused by charge accumulation. We also demonstrate that source-end potential engineering to electrically reduce the bottleneck barrier length can result in a ballistic current even in longer channel devices.
Keywords :
MOSFET; ballistic transport; phonons; space charge; ballistic current; channel length; charge accumulation; drive current; energy relaxation; inelastic phonon emission; phonon scattering; quasiballistic MOSFET; quasiballistic transport; space charge effects; Absorption; Acoustic scattering; Degradation; Electrodes; Kinetic energy; MOSFETs; Optical scattering; Particle scattering; Phonons; Quantum computing; Backscattering; elastic and inelastic scattering; nanoscale MOSFETs; quantum-corrected Monte Carlo simulation; quasi-ballistic transport; source-end velocity;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2008.927384
Filename :
4585393
Link To Document :
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