DocumentCode
822554
Title
Amorphous Silicon 3-D Tapers for Si Photonic Wires Fabricated With Shadow Masks
Author
Harke, Alexander ; Lipka, Timo ; Amthor, Julia ; Horn, Oliver ; Krause, Michael ; Müller, Jörg
Author_Institution
Dept. of Microsyst. Eng., Hamburg Univ. of Technol., Hamburg
Volume
20
Issue
17
fYear
2008
Firstpage
1452
Lastpage
1454
Abstract
Three-dimensional taper structures made from plasma-enhanced chemical vapor-deposited hydrogenated amorphous silicon were evaluated by calculating the deposition profiles with a line-of-sight model and the corresponding mode profiles with a full-vectorial mode solver. The tapers were fabricated with shadow-masks made from KOH-etched Si wafers, and with the tapers light was coupled into 500-nm-wide photonic wires from lensed fibers.
Keywords
amorphous semiconductors; masks; plasma CVD; potassium compounds; silicon; 3D tapers structures; KOH; Si; full-vectorial mode solver; hydrogenated amorphous silicon; plasma-enhanced chemical vapor deposition; shadow masks; silicon photonic wires; Amorphous silicon; Etching; Optical coupling; Optical device fabrication; Optical fiber couplers; Optical losses; Optical waveguides; Photonic crystals; Plasma applications; Wires; Optical device fabrication; optical fiber couplers; optical waveguides;
fLanguage
English
Journal_Title
Photonics Technology Letters, IEEE
Publisher
ieee
ISSN
1041-1135
Type
jour
DOI
10.1109/LPT.2008.927891
Filename
4585418
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