Ferroelectric emission studies for electron emission lithography applications

Author

Yoo, In K. ; Ryu, Sang O. ; Suchicital, Carlos T A ; Lee, June K. ; Kim, Byong M. ; Chung, Chee W.

Author_Institution

Samsung Adv. Inst. of Technol., Suwon, South Korea

Volume

50

Issue

10

fYear

2003

Firstpage

1247

Lastpage

1252

Abstract

Ferroelectric switching emission, dielectric switching emission, and pyroelectric emission were studied by patterning images on electron resist for electron emission lithography applications. It was observed that the pyroelectric emission is most acceptable for a high throughput 1:1 electron projection lithography application. A 1:1 electron projection lithography was demonstrated by patterning images with line widths of 30 /spl mu/m and using pyroelectric emission. A degradation of the pyroelectric emission property of the material was observed during repeated heating cycles below the phase-transition temperature of the ferroelectric material. Annealing excursions above the phase transition temperature prevented the degradation of the pyroelectric emitter.

Keywords

annealing; electron beam lithography; electron emission; ferroelectric switching; ferroelectric transitions; pyroelectricity; annealing; dielectric switching emission; electron emission lithography; electron projection lithography; electron resist; ferroelectric emission; ferroelectric switching emission; image patterning; phase transition temperature; pyroelectric emission; Degradation; Dielectrics; Electron emission; Ferroelectric materials; Heating; Lithography; Pyroelectricity; Resists; Temperature; Throughput;

fLanguage

English

Journal_Title

Ultrasonics, Ferroelectrics, and Frequency Control, IEEE Transactions on

Publisher

ieee

ISSN

0885-3010

Type

jour

DOI

10.1109/TUFFC.2003.1244740

Filename

1244740