Title :
Charge Yield and Dose Effects in MOS Capacitors at 80 K
Author :
Boesch, H.E., Jr. ; McGarrity, J.M.
Author_Institution :
Harry Diamond Laboratories Adelphi, Maryland 20783
Keywords :
Capacitance-voltage characteristics; Charge measurement; Current measurement; DNA; Electric variables measurement; Ionizing radiation; Linear particle accelerator; MOS capacitors; Pulse measurements; Temperature;
Journal_Title :
Nuclear Science, IEEE Transactions on
DOI :
10.1109/TNS.1976.4328532
