DocumentCode
825864
Title
Epitaxial Silicon Semiconductor Detectors Past Developments, Future Prospects
Author
Gruhn, C.R.
Author_Institution
University of California, Los Alamos Scientific Laboratory, P. O. Box 1663, Los Alamos, NM 87545
Volume
24
Issue
1
fYear
1977
Firstpage
93
Lastpage
103
Abstract
A review of the main physical characteristics of epitaxial silicon as it relates to detector development is presented. As examples of applications results are presented on (1) epitaxial silicon avalanche diodes (ESAD); signal-to-noise, non-linear aspects of the avalanche gain mechanism, gain-bandwidth product, (2) ultrathin epitaxial silicon surface barrier (ESSB) detectors, response to heavy ions, (3) an all-epitaxial silicon diode (ESD), response to heavy ions, charge transport and charge defect. Future prospects of epitaxial silicon as it relates to new detector designs are summarized.
Keywords
Conductivity; Detectors; Epitaxial layers; Schottky barriers; Schottky diodes; Semiconductor diodes; Semiconductor impurities; Semiconductor materials; Silicon; Substrates;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.1977.4328649
Filename
4328649
Link To Document