• DocumentCode
    825864
  • Title

    Epitaxial Silicon Semiconductor Detectors Past Developments, Future Prospects

  • Author

    Gruhn, C.R.

  • Author_Institution
    University of California, Los Alamos Scientific Laboratory, P. O. Box 1663, Los Alamos, NM 87545
  • Volume
    24
  • Issue
    1
  • fYear
    1977
  • Firstpage
    93
  • Lastpage
    103
  • Abstract
    A review of the main physical characteristics of epitaxial silicon as it relates to detector development is presented. As examples of applications results are presented on (1) epitaxial silicon avalanche diodes (ESAD); signal-to-noise, non-linear aspects of the avalanche gain mechanism, gain-bandwidth product, (2) ultrathin epitaxial silicon surface barrier (ESSB) detectors, response to heavy ions, (3) an all-epitaxial silicon diode (ESD), response to heavy ions, charge transport and charge defect. Future prospects of epitaxial silicon as it relates to new detector designs are summarized.
  • Keywords
    Conductivity; Detectors; Epitaxial layers; Schottky barriers; Schottky diodes; Semiconductor diodes; Semiconductor impurities; Semiconductor materials; Silicon; Substrates;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.1977.4328649
  • Filename
    4328649