• DocumentCode
    825877
  • Title

    Anaerobic Treatment of Tetra-Methyl Ammonium Hydroxide (TMAH) Containing Wastewater

  • Author

    Chang, Kuan-Foo ; Yang, Show-Ying ; You, Huey-Song ; Pan, Jill Ruhsing

  • Author_Institution
    Energy & Environ. Res. Labs., Ind. Technol. Res. Inst., Hsinchu
  • Volume
    21
  • Issue
    3
  • fYear
    2008
  • Firstpage
    486
  • Lastpage
    491
  • Abstract
    Toxicity of tetra-methyl ammonium hydroxide (TMAH) was investigated in an upflow anaerobic sludge bed (UASB) by anaerobic toxicity assay test. System performance was determined by monitoring total organic carbon (TOC) and ion chromatograph (IC) analysis. The result indicates that TMAH concentration less than 10000 mg/L is nontoxic to the anaerobic archaea. TMAH containing in the wastewater was completely degraded under anaerobic condition and was transferred to biogas (CH4 and CO2) and NH3. The maximum volumetric loading of UASB is 6.95 kg TMAH/m3 -day (4.0 kg TOC/m3 -day) and 7.30 kg TMAH/m3 -day (4.1 kg TOC/m -day) for synthetic wastewater and wastewater from a full-scale thin-film transistor liquid crystal display manufacturing industry during the 240-day experiment, respectively. The removal efficiencies of THAM containing wastewater were both higher than 95% treated by UASB.
  • Keywords
    liquid crystal displays; organic compounds; thin film transistors; wastewater treatment; anaerobic condition; anaerobic toxicity assay test; full-scale thin-film transistor liquid crystal display manufacturing; ion chromatograph analysis; tetra-methyl ammonium hydroxide; total organic carbon; upflow anaerobic sludge bed; Biodegradation; Degradation; Liquid crystal displays; Microorganisms; Oxidation; Performance analysis; System performance; Testing; Thin film transistors; Wastewater treatment; Anaerobic; anaerobic toxicity assay (ATA) test; methanogen; tetra-methyl ammonium hydroxide (TMAH); thin-film transistor liquid crystal display (TFT-LCD); upflow anaerobic sludge bed (UASB);
  • fLanguage
    English
  • Journal_Title
    Semiconductor Manufacturing, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0894-6507
  • Type

    jour

  • DOI
    10.1109/TSM.2008.2001227
  • Filename
    4589024