DocumentCode :
828226
Title :
Design and fabrication of highly efficient GaN-based light-emitting diodes
Author :
Kim, Hyunsoo ; Park, Seong-Ju ; Hwang, Hyunsang
Author_Institution :
Dept. of Mater. Sci. & Eng., Kwangju Inst. of Sci. & Technol., South Korea
Volume :
49
Issue :
10
fYear :
2002
fDate :
10/1/2002 12:00:00 AM
Firstpage :
1715
Lastpage :
1722
Abstract :
A promising fabrication method and an innovative geometrical design for highly efficient GaN-based light-emitting diodes (LEDs) were investigated based on the current spreading phenomenon. Based on theoretical considerations, it was possible to determine the critical transparent-electrode thickness, which resulted in significant improvements in the electrical and optical characteristics of LEDs. In addition, we were able to define conditions for an ideal geometrical design and the resulting product exhibited significant improvements in characteristics in spite of the fact that a transparent electrode, acting as a p-type current spreader, was not used. Considering the simple fabrication process and good device performance, the proposed fabrication methods, as well as the innovative geometrical design, have considerable promise for use in practical applications.
Keywords :
III-V semiconductors; gallium compounds; indium compounds; light emitting diodes; quantum well devices; semiconductor quantum wells; wide band gap semiconductors; GaN; InGaN-GaN; InGaN/GaN MQW LED; critical transparent-electrode thickness; current spreading phenomenon; electrical characteristics; fabrication method; geometrical design; highly efficient GaN-based LEDs; optical characteristics; Conductive films; Conductivity; Electrodes; Gallium nitride; Geometrical optics; Light emitting diodes; Optical design; Optical device fabrication; Optical films; Surface resistance;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2002.802625
Filename :
1036078
Link To Document :
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