DocumentCode
828226
Title
Design and fabrication of highly efficient GaN-based light-emitting diodes
Author
Kim, Hyunsoo ; Park, Seong-Ju ; Hwang, Hyunsang
Author_Institution
Dept. of Mater. Sci. & Eng., Kwangju Inst. of Sci. & Technol., South Korea
Volume
49
Issue
10
fYear
2002
fDate
10/1/2002 12:00:00 AM
Firstpage
1715
Lastpage
1722
Abstract
A promising fabrication method and an innovative geometrical design for highly efficient GaN-based light-emitting diodes (LEDs) were investigated based on the current spreading phenomenon. Based on theoretical considerations, it was possible to determine the critical transparent-electrode thickness, which resulted in significant improvements in the electrical and optical characteristics of LEDs. In addition, we were able to define conditions for an ideal geometrical design and the resulting product exhibited significant improvements in characteristics in spite of the fact that a transparent electrode, acting as a p-type current spreader, was not used. Considering the simple fabrication process and good device performance, the proposed fabrication methods, as well as the innovative geometrical design, have considerable promise for use in practical applications.
Keywords
III-V semiconductors; gallium compounds; indium compounds; light emitting diodes; quantum well devices; semiconductor quantum wells; wide band gap semiconductors; GaN; InGaN-GaN; InGaN/GaN MQW LED; critical transparent-electrode thickness; current spreading phenomenon; electrical characteristics; fabrication method; geometrical design; highly efficient GaN-based LEDs; optical characteristics; Conductive films; Conductivity; Electrodes; Gallium nitride; Geometrical optics; Light emitting diodes; Optical design; Optical device fabrication; Optical films; Surface resistance;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2002.802625
Filename
1036078
Link To Document