Title :
Optimization of characteristics related to the emitter-base junction in self-aligned SEG SiGe HBTs and their application in 72-GHz-static/92-GHz-dynamic frequency dividers
Author :
Washio, Katsuyoshi ; Ohue, Eiji ; Oda, Katsuya ; Hayami, Reiko ; Tanabe, Masamichi ; Shimamoto, Hiromi
Author_Institution :
Central Res. Lab., Hitachi Ltd., Tokyo, Japan
fDate :
10/1/2002 12:00:00 AM
Abstract :
Characteristics related to the emitter-base junction of self-aligned selective-epitaxial-growth SiGe heterojunction bipolar transistors (HBTs) were optimized for use with a highly-doped base. The thickness of the Si-cap layer affected both the emitter-base junction concentration and space-charge width, so the dc and ac characteristics of the SiGe HBTs were in turn dependent on this thickness. With a 4×1019-cm-3 boron-doped base, a 131-GHz cutoff frequency and ECL gate-delay time of 5.4 ps were achieved for the optimized SiGe HBTs. A static frequency divider with a maximum operating frequency of 72.2 GHz and a dynamic frequency divider with a maximum operating frequency of 92.4 GHz were developed for optical-fiber link and millimeter-wave communication systems of the future.
Keywords :
Ge-Si alloys; chemical vapour deposition; emitter-coupled logic; frequency dividers; heterojunction bipolar transistors; millimetre wave bipolar transistors; millimetre wave frequency convertors; optical communication equipment; semiconductor materials; vapour phase epitaxial growth; 131 GHz; 5.4 ps; 72 GHz static frequency divider; 72.2 GHz; 92 GHz dynamic frequency divider; 92.4 GHz; ECL gate-delay time; Si-cap layer thickness; SiGe-Si; UHV/CVD system; ac characteristics; cutoff frequency; dc characteristics; emitter-base junction characteristics optimization; emitter-base junction concentration; highly-doped base; maximum operating frequency; millimeter-wave communication systems; optical-fiber link systems; self-aligned SEG SiGe HBTs; self-aligned selective-epitaxial-growth SiGe heterojunction bipolar transistors; space-charge width; Cutoff frequency; Frequency conversion; Germanium silicon alloys; Heterojunction bipolar transistors; MIMICs; Millimeter wave communication; Millimeter wave technology; Millimeter wave transistors; Optical frequency conversion; Silicon germanium;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/TED.2002.803661