• DocumentCode
    828902
  • Title

    Experimental realization of a new transistor

  • Author

    Chen, Jing ; Yang, Chia-Hung ; Wilson, Richard A.

  • Author_Institution
    Dept. of Electr. Eng., Maryland Univ., College Park, MD, USA
  • Volume
    40
  • Issue
    2
  • fYear
    1993
  • fDate
    2/1/1993 12:00:00 AM
  • Firstpage
    267
  • Lastpage
    272
  • Abstract
    The authors report on the fabrication and characteristics of a unipolar, three-terminal, resonant-tunneling transistor. The operating principle of this new transistor is based on the fact that the quantum mechanical resonant-tunneling probability of hot electrons between the emitter and the collector is switched almost completely on and off, when either the base or the collector bias is swept. The emitter injects hot electrons to the second lowest subband of a thin (100 Å in this work) GaAs quantum well. Subsequently, the hot electrons will either resonantly tunnel to the collector, or relax to the lowest subband and contribute to the base current. As a result of resonant transmission, at 77 K the current-voltage characteristics of the transistor display negative differential resistance with extremely large (4691) peak-to-valley ratio. Furthermore, when biased near resonance, a maximum DC current gain of ~1.2 and a maximum AC current gain of ~11.9 were observed. The first use of a new `tunneling-in and tunneling-out´ scheme in contacting a thin quantum well is also demonstrated
  • Keywords
    III-V semiconductors; aluminium compounds; gallium arsenide; hot electron transistors; negative resistance; resonant tunnelling devices; GaAs quantum well; GaAs-AlxGa1-xAs; base current; current-voltage characteristics; hot electrons; maximum AC current gain; maximum DC current gain; negative differential resistance; peak-to-valley ratio; quantum mechanical resonant-tunneling probability; resonant transmission; tunnelling in tunnelling out scheme; unipolar three terminal resonant tunnelling transistor; Current-voltage characteristics; Displays; Electron emission; Fabrication; Gallium arsenide; Helium; Molecular beam epitaxial growth; Quantum mechanics; Resonance; Resonant tunneling devices;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.182499
  • Filename
    182499