Title :
Reduction of 1/f noise in multiplexed linear In/sub 0.53/Ga/sub 0.47/As detector arrays via epitaxial doping
Author :
Joshi, Abhay M. ; Olsen, Gregory H. ; Ban, Vladimir S. ; Mykietyn, Edward, Sr. ; Lange, Michael J. ; Mohr, Daniel T.
Author_Institution :
EPITAXX, Inc., West Trenton, NJ, USA
Abstract :
A significant (2-5*) reduction in 1/f noise was observed in In0.53Ga0.47 As photodetector arrays read out by a PMOS multiplexer, when the epitaxial InP cap layer doping was changed from undoped to sulfur-doped n type of about 3*1016 cm-3. A further decrease was observed when the InP buffer layer was also changed from undoped to sulfur-doped n type of about 5*1017 cm-3. Data was presented for the variation of 1/f noise, within a temperature range of 18 degrees C to -40 degrees C. Surface states at the InP cap/SiN interface appears to be the primary source of 1/f noise, with the bulk states at the n- In0.53Ga0.47As buffer hetero-interface as a secondary source. Increased n-type doping in the high-bandgap InP cap and buffer layers may reduce electron trapping, and thus 1/f noise. The measured noise spectrum of InGaAs photodetectors varies as fy with y being approximately -0.45 for device structures with doped and undoped InP can layers. For a doped InP buffer layer, this value of y is -0.3.
Keywords :
III-V semiconductors; electron traps; gallium arsenide; indium compounds; infrared detectors; interface electron states; multiplexing; random noise; semiconductor device noise; semiconductor doping; surface electron states; 1/f noise; In0.53Ga0.47 As photodetector arrays; InP-SiN; InP:S; PMOS multiplexer; bulk states; electron trapping; epitaxial InP cap layer; epitaxial doping; n-type doping; noise reduction; noise spectrum; surface states; Buffer layers; Detectors; Doping; Indium phosphide; Multiplexing; Noise reduction; Photodetectors; Sensor arrays; Silicon compounds; Temperature distribution;
Journal_Title :
Electron Devices, IEEE Transactions on