• DocumentCode
    829107
  • Title

    High-frequency characteristics of low-temperature pseudo-heterojunction bipolar transistors

  • Author

    Miyamoto, Masafumi ; Yano, Kazuo ; Tamaki, Yoichi ; Aoki, Masaaki ; Nishida, Takashi ; Seki, Koichi ; Shimohigashi, Katsuhiro

  • Author_Institution
    Hitachi Ltd., Tokyo, Japan
  • Volume
    40
  • Issue
    2
  • fYear
    1993
  • fDate
    2/1/1993 12:00:00 AM
  • Firstpage
    378
  • Lastpage
    384
  • Abstract
    The high-frequency characteristics of a pseudojunction bipolar transistor (pseudo-HBT), which operates like an HBT despite a metallurgical homojunction utilizing a bandgap narrowing effect, are analyzed both theoretically and experimentally. Several design features used to achieve a high cutoff frequency at low temperatures are discussed. They include (1) a low-impurity-concentration graft base, (2) an abrupt base profile to obtain a large effective-bandgap difference between the base and the emitter, and (3) an inversely graded base profile, in which the impurity concentration increases from the emitter side to the collector side, to effectively reduce the base transit time. The pseudo-HBT with a low-concentration graft base shows a higher cutoff frequency below 100 K than at room temperature. These features are also appropriate for conventional bipolar transistors operating at low temperatures
  • Keywords
    cryogenics; doping profiles; heterojunction bipolar transistors; semiconductor technology; 100 to 300 K; 300 to 800 MHz; abrupt base profile; bandgap narrowing effect; base transit time; design features; high cutoff frequency; high-frequency characteristics; impurity concentration; inversely graded base profile; low-impurity-concentration graft base; low-temperature pseudo-heterojunction bipolar transistors; metallurgical homojunction; pseudo-HBT; Bipolar transistors; Cutoff frequency; Degradation; Electron emission; Heterojunction bipolar transistors; Impurities; Optimization methods; Photonic band gap; Silicon germanium; Temperature;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.182517
  • Filename
    182517