Title :
High-frequency characteristics of low-temperature pseudo-heterojunction bipolar transistors
Author :
Miyamoto, Masafumi ; Yano, Kazuo ; Tamaki, Yoichi ; Aoki, Masaaki ; Nishida, Takashi ; Seki, Koichi ; Shimohigashi, Katsuhiro
Author_Institution :
Hitachi Ltd., Tokyo, Japan
fDate :
2/1/1993 12:00:00 AM
Abstract :
The high-frequency characteristics of a pseudojunction bipolar transistor (pseudo-HBT), which operates like an HBT despite a metallurgical homojunction utilizing a bandgap narrowing effect, are analyzed both theoretically and experimentally. Several design features used to achieve a high cutoff frequency at low temperatures are discussed. They include (1) a low-impurity-concentration graft base, (2) an abrupt base profile to obtain a large effective-bandgap difference between the base and the emitter, and (3) an inversely graded base profile, in which the impurity concentration increases from the emitter side to the collector side, to effectively reduce the base transit time. The pseudo-HBT with a low-concentration graft base shows a higher cutoff frequency below 100 K than at room temperature. These features are also appropriate for conventional bipolar transistors operating at low temperatures
Keywords :
cryogenics; doping profiles; heterojunction bipolar transistors; semiconductor technology; 100 to 300 K; 300 to 800 MHz; abrupt base profile; bandgap narrowing effect; base transit time; design features; high cutoff frequency; high-frequency characteristics; impurity concentration; inversely graded base profile; low-impurity-concentration graft base; low-temperature pseudo-heterojunction bipolar transistors; metallurgical homojunction; pseudo-HBT; Bipolar transistors; Cutoff frequency; Degradation; Electron emission; Heterojunction bipolar transistors; Impurities; Optimization methods; Photonic band gap; Silicon germanium; Temperature;
Journal_Title :
Electron Devices, IEEE Transactions on