• DocumentCode
    831375
  • Title

    High Performance Radiation Hard CMOS/SOS Technology

  • Author

    Yuan, J.H. ; Harari, E.

  • Author_Institution
    Newport Beach Research Center Hughes Aircraft Company 500 Superior Avenue Newport Beach, California 92663
  • Volume
    24
  • Issue
    6
  • fYear
    1977
  • Firstpage
    2199
  • Lastpage
    2204
  • Abstract
    This paper describes the ionizing radiation effects on Si-gate CMOS/SOS short channel devices having channel lengths ranging from 1.8¿m to 3.8¿m. These short channel CMOS/SOS devices exhibit very high speed performance; the 1.8¿m channel length devices achieve a propagation delay time of 0.19 ns at 10V and 0.26 ns at 5V while the 2.8¿m channel length devices achieve a propagation delay time of 0.41 ns at 10V and 0.71 ns at 5V. Post-radiation n-channel back leakages of ¿0.1¿a/mil of channel width and threshold voltage shifts of ¿ 1V for both n and p-channel devices were obtained after 106 rads (Si) on the 2.8¿m channel length devices.
  • Keywords
    Aircraft; CMOS logic circuits; CMOS process; CMOS technology; Doping; Ionizing radiation; Metallization; Propagation delay; Radiation effects; Threshold voltage;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.1977.4329192
  • Filename
    4329192