DocumentCode
831375
Title
High Performance Radiation Hard CMOS/SOS Technology
Author
Yuan, J.H. ; Harari, E.
Author_Institution
Newport Beach Research Center Hughes Aircraft Company 500 Superior Avenue Newport Beach, California 92663
Volume
24
Issue
6
fYear
1977
Firstpage
2199
Lastpage
2204
Abstract
This paper describes the ionizing radiation effects on Si-gate CMOS/SOS short channel devices having channel lengths ranging from 1.8¿m to 3.8¿m. These short channel CMOS/SOS devices exhibit very high speed performance; the 1.8¿m channel length devices achieve a propagation delay time of 0.19 ns at 10V and 0.26 ns at 5V while the 2.8¿m channel length devices achieve a propagation delay time of 0.41 ns at 10V and 0.71 ns at 5V. Post-radiation n-channel back leakages of ¿0.1¿a/mil of channel width and threshold voltage shifts of ¿ 1V for both n and p-channel devices were obtained after 106 rads (Si) on the 2.8¿m channel length devices.
Keywords
Aircraft; CMOS logic circuits; CMOS process; CMOS technology; Doping; Ionizing radiation; Metallization; Propagation delay; Radiation effects; Threshold voltage;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.1977.4329192
Filename
4329192
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