DocumentCode
831689
Title
Calculations of Second Breakdown
Author
Ward, A.L.
Author_Institution
Harry Diamond Laboratories Adelphi, Maryland 20783
Volume
24
Issue
6
fYear
1977
Firstpage
2357
Lastpage
2360
Abstract
A computer program based on an electrothermal model has been used to study the initiation of second breakdown in silicon diodes. Extensive calculations of temperature-dependent static characteristics have been made for a 12-¿m N-type diode doped to 3 à 1015 cm-3. These characteristics, together with the variation of the temporal rate of temperature increase with current, have been used to calculate both current and voltage versus time curves out to 100 ¿s. The resulting calculated power versus time-to-breakdown curve agrees well with published experimental data for 1N4148 diodes (similar doping and geometry) up to 1 ¿s, but the calculated power is lower at longer times for an infinite thermal time constant. Agreement is extended to 100 ¿s with a thermal time constant of 2 ¿s. Calculations have also been made of the temperature variation of current-voltage static characteristics for thin film silicon-on-sapphire diodes. Reasonable agreement is obtained with published measured curves.
Keywords
Current density; Doping; Electric breakdown; Electrothermal effects; Poisson equations; Semiconductor diodes; Silicon; Temperature; Thermal conductivity; Voltage;
fLanguage
English
Journal_Title
Nuclear Science, IEEE Transactions on
Publisher
ieee
ISSN
0018-9499
Type
jour
DOI
10.1109/TNS.1977.4329221
Filename
4329221
Link To Document