• DocumentCode
    831689
  • Title

    Calculations of Second Breakdown

  • Author

    Ward, A.L.

  • Author_Institution
    Harry Diamond Laboratories Adelphi, Maryland 20783
  • Volume
    24
  • Issue
    6
  • fYear
    1977
  • Firstpage
    2357
  • Lastpage
    2360
  • Abstract
    A computer program based on an electrothermal model has been used to study the initiation of second breakdown in silicon diodes. Extensive calculations of temperature-dependent static characteristics have been made for a 12-¿m N-type diode doped to 3 × 1015 cm-3. These characteristics, together with the variation of the temporal rate of temperature increase with current, have been used to calculate both current and voltage versus time curves out to 100 ¿s. The resulting calculated power versus time-to-breakdown curve agrees well with published experimental data for 1N4148 diodes (similar doping and geometry) up to 1 ¿s, but the calculated power is lower at longer times for an infinite thermal time constant. Agreement is extended to 100 ¿s with a thermal time constant of 2 ¿s. Calculations have also been made of the temperature variation of current-voltage static characteristics for thin film silicon-on-sapphire diodes. Reasonable agreement is obtained with published measured curves.
  • Keywords
    Current density; Doping; Electric breakdown; Electrothermal effects; Poisson equations; Semiconductor diodes; Silicon; Temperature; Thermal conductivity; Voltage;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/TNS.1977.4329221
  • Filename
    4329221