• DocumentCode
    832992
  • Title

    Fast neutron radiation effects in silicon detectors fabricated by different thermal oxidation processes

  • Author

    Li, Zheng ; Kraner, H.W.

  • Author_Institution
    Brookhaven Nat. Lab., Upton, NY, USA
  • Volume
    39
  • Issue
    4
  • fYear
    1992
  • fDate
    8/1/1992 12:00:00 AM
  • Firstpage
    577
  • Lastpage
    583
  • Abstract
    High resistivity silicon detectors along with MOS capacitors made on five silicon dioxides with different thermal conditions (975°C to 1200°C) have been exposed to fast neutron irradiation up to the fluence of a few times 1014 n/cm2. New measurement techniques such as capacitance-voltage of MOS capacitors and current-voltage and back-to-back diodes (p+-n--p + if n- is not inverted to p) or resistors (p+-p-p+ if inverted) have been introduced in this study in monitoring the possible type-inversion (n→p) under high neutron fluence. No type-inversion in the material underneath SiO2 and the p+ contact has been observed for detectors made on the five oxides up to the neutron fluence of a few times 1013 n/cm2. However, it has been found that detectors made on higher temperature oxides (⩾1100°C) exhibited less leakage current increase at high neutron fluence
  • Keywords
    metal-insulator-semiconductor devices; neutron effects; semiconductor counters; 975 to 1200 degC; MOS capacitors; SiO2; back-to-back diodes; capacitance-voltage; current-voltage; fast neutron irradiation; high resistivity Si detectors; leakage current; neutron fluence; p+-n--p+; p+-p-p+; thermal oxidation processes; type-inversion; Capacitance-voltage characteristics; Conductivity; Diodes; MOS capacitors; Measurement techniques; Neutron radiation effects; Radiation detectors; Silicon compounds; Silicon radiation detectors; Thermal resistance;
  • fLanguage
    English
  • Journal_Title
    Nuclear Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9499
  • Type

    jour

  • DOI
    10.1109/23.159668
  • Filename
    159668