• DocumentCode
    833619
  • Title

    Distribution of Ion-Current Density on Substrate Between Carbon Nanotubes Grown From Low-Temperature Plasma

  • Author

    Levchenko, I. ; Ostrikov, K. ; Xu, S.

  • Author_Institution
    Sch. of Phys., Plasma Nanosci., Univ. of Sydney, Sydney, NSW
  • Volume
    36
  • Issue
    4
  • fYear
    2008
  • Firstpage
    864
  • Lastpage
    865
  • Abstract
    Using Monte Carlo simulation technique, we have calculated the distribution of ion current extracted from low-temperature plasmas and deposited onto the substrate covered with a nanotube array. We have shown that a free-standing carbon nanotube is enclosed in a circular bead of the ion current, whereas in square and hexagonal nanotube patterns, the ion current is mainly concentrated along the lines connecting the nearest nanotubes. In a very dense array (with the distance between nanotubes/nanotube-height ratio less than 0.05), the ions do not penetrate to the substrate surface and deposit on side surfaces of the nanotubes.
  • Keywords
    Monte Carlo methods; carbon nanotubes; current density; nanotechnology; plasma materials processing; plasma transport processes; C; Monte Carlo simulation; carbon nanotubes; circular bead; hexagonal nanotube patterns; ion-current density distribution; low-temperature plasma; square nanotube patterns; substrate surface; Australia; Carbon nanotubes; Kinetic theory; Plasma accelerators; Plasma chemistry; Plasma density; Plasma properties; Plasma sheaths; Plasma simulation; Plasma sources; Nanotubes; plasma-surface interaction;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2008.924406
  • Filename
    4599036