DocumentCode
833733
Title
MEMS resonators that are robust to process-induced feature width variations
Author
Liu, Rong ; Paden, Brad ; Turner, Kimberly
Author_Institution
California Univ., Santa Barbara, CA, USA
Volume
11
Issue
5
fYear
2002
fDate
10/1/2002 12:00:00 AM
Firstpage
505
Lastpage
511
Abstract
A stability analysis and design method for MEMS resonators is presented. The frequency characteristics of a laterally vibrating resonator are analyzed. With the fabrication error on the sidewall of the structure being considered, the first and second order frequency sensitivities to the fabrication error are derived. A simple relationship between the proof mass area and perimeter, and the beam width, is developed for single material structures, which expresses that the proof mass perimeter times the beam width should equal six times the area of the proof mass. Design examples are given for the single material and multi-layer structures. The results and principles presented in the paper can be used to analyze and design other MEMS resonators.
Keywords
frequency stability; micromechanical resonators; MEMS resonator; beam width; design method; fabrication error; frequency sensitivity; lateral vibration; multilayer structure; process variation; proof mass; single material structure; stability analysis; Fabrication; Gyroscopes; Micromechanical devices; Optical resonators; Process design; Radio frequency; Resonant frequency; Robustness; Sputter etching; Stability analysis;
fLanguage
English
Journal_Title
Microelectromechanical Systems, Journal of
Publisher
ieee
ISSN
1057-7157
Type
jour
DOI
10.1109/JMEMS.2002.803279
Filename
1038845
Link To Document