• DocumentCode
    833733
  • Title

    MEMS resonators that are robust to process-induced feature width variations

  • Author

    Liu, Rong ; Paden, Brad ; Turner, Kimberly

  • Author_Institution
    California Univ., Santa Barbara, CA, USA
  • Volume
    11
  • Issue
    5
  • fYear
    2002
  • fDate
    10/1/2002 12:00:00 AM
  • Firstpage
    505
  • Lastpage
    511
  • Abstract
    A stability analysis and design method for MEMS resonators is presented. The frequency characteristics of a laterally vibrating resonator are analyzed. With the fabrication error on the sidewall of the structure being considered, the first and second order frequency sensitivities to the fabrication error are derived. A simple relationship between the proof mass area and perimeter, and the beam width, is developed for single material structures, which expresses that the proof mass perimeter times the beam width should equal six times the area of the proof mass. Design examples are given for the single material and multi-layer structures. The results and principles presented in the paper can be used to analyze and design other MEMS resonators.
  • Keywords
    frequency stability; micromechanical resonators; MEMS resonator; beam width; design method; fabrication error; frequency sensitivity; lateral vibration; multilayer structure; process variation; proof mass; single material structure; stability analysis; Fabrication; Gyroscopes; Micromechanical devices; Optical resonators; Process design; Radio frequency; Resonant frequency; Robustness; Sputter etching; Stability analysis;
  • fLanguage
    English
  • Journal_Title
    Microelectromechanical Systems, Journal of
  • Publisher
    ieee
  • ISSN
    1057-7157
  • Type

    jour

  • DOI
    10.1109/JMEMS.2002.803279
  • Filename
    1038845