• DocumentCode
    833747
  • Title

    Plasma Ionization in Low-Pressure Radio-Frequency Discharges—Part II: Particle-in-Cell Simulation

  • Author

    Meige, A. ; Connell, D.O. ; Gans, T. ; Boswell, R.W.

  • Author_Institution
    Lab. de Phys. et Technol. des Plasmas, Ecole Polytech., Palaiseau
  • Volume
    36
  • Issue
    4
  • fYear
    2008
  • Firstpage
    1384
  • Lastpage
    1385
  • Abstract
    Plasma ionization in the low-pressure operation regime (< 5 Pa) of RF capacitively coupled plasmas (CCPs) is governed by a complex interplay of various mechanisms, such as field reversal, sheath expansion, and wave-particle interactions. In a previous paper, it was shown that experimental observations in a hydrogen CCP operated at 13.56 MHz are qualitatively well described in a 1-D symmetrical particle-in-cell (PIC) simulation. In this paper, a spherical asymmetrical PIC simulation that is closer to the conditions of the highly asymmetrical experimental device is used to simulate a low-pressure neon CCP operated at 2 MHz. The results show a similar behavior, with pronounced ionization through field reversal, sheath expansion, and wave-particle interactions, and can be exploited for more accurate quantitative comparisons with experimental observations.
  • Keywords
    high-frequency discharges; hydrogen; neon; plasma collision processes; plasma sheaths; plasma simulation; H; Ne; RF capacitively coupled plasmas; field reversal; frequency 13.56 MHz; frequency 2 MHz; hydrogen CCP; low-pressure neon CCP; low-pressure radiofrequency discharge; particle-in-cell simulation; plasma ionization; sheath expansion; wave-particle interaction; Circuit simulation; Electrodes; Ionization; Plasma applications; Plasma diagnostics; Plasma sheaths; Plasma simulation; Plasma waves; Radio frequency; Space technology; Capacitively coupled plasma (CCP); RF; field reversal; heating; particle-in-cell (PIC) simulation; wave particle interaction;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2008.926833
  • Filename
    4599048