• DocumentCode
    833777
  • Title

    Development and characterization of micromachined hollow cathode plasma display devices

  • Author

    Chen, Jack ; Park, Sung-Jin ; Fan, Zhifang ; Eden, J. Gary ; Liu, Chang

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Illinois Univ., Urbana, IL, USA
  • Volume
    11
  • Issue
    5
  • fYear
    2002
  • fDate
    10/1/2002 12:00:00 AM
  • Firstpage
    536
  • Lastpage
    543
  • Abstract
    In this paper, we report the development of hollow cathode micro plasma devices made using micromachining techniques. Compared with larger discharge devices, micromachined discharge devices operate at much higher pressures, up to 1 atm. Linear current-voltage relationships are obtained, potentially simplifying the control electronics for such devices. The size of micromachined discharge units is reduced and the distribution of sizes and light intensity in an array is more uniform relative to previous devices.
  • Keywords
    cathodes; glow discharges; micromachining; plasma displays; control electronics; hollow cathode plasma display devices; light intensity; linear current-voltage relationships; micromachined discharge devices; micromachining techniques; Acceleration; Associate members; Cathodes; Electrons; Fault location; Glow discharges; Lifting equipment; Plasma devices; Plasma displays; Voltage;
  • fLanguage
    English
  • Journal_Title
    Microelectromechanical Systems, Journal of
  • Publisher
    ieee
  • ISSN
    1057-7157
  • Type

    jour

  • DOI
    10.1109/JMEMS.2002.802907
  • Filename
    1038849