Title :
Fabrication and measurement of tall stacked arrays of SNS Josephson junctions
Author :
Hadacek, Nicolas ; Dresselhaus, P.D. ; Chong, Y. ; Benz, S.P. ; Bonevich, J.E.
Author_Institution :
Nat. Inst. of Stand. & Technol., Boulder, CO, USA
fDate :
6/1/2005 12:00:00 AM
Abstract :
The authors have made tall, uniform stacked Josephson junction arrays by developing an etch process using an inductively coupled plasma etcher. This process produces vertical profiles in thin-film multilayers of alternating superconducting and normal metals. Such a vertical etch is necessary to obtain uniform properties in high-density arrays in order to achieve operating margins for voltage-standard applications. The authors use dry-etchable MoSi2 for the normal metal barrier of our niobium Josephson junctions and obtain working series arrays with stacks up to 10 junctions tall. The authors present dc and microwave electrical characteristics of distributed and lumped arrays and discuss the technological improvements needed to fabricate lumped arrays for voltage-standard applications.
Keywords :
molybdenum compounds; multilayers; niobium; sputter etching; superconducting arrays; superconducting thin films; superconductor-normal-superconductor devices; voltage measurement; DC electrical characteristics; MoSi2; Ni; SNS Josephson junctions; distributed arrays; inductively coupled plasma etcher; lumped arrays; microwave electrical characteristics; tall stacked array fabrication; tall stacked array measurement; vertical profiles; voltage standard; Etching; Fabrication; Josephson junctions; Microwave antenna arrays; Nonhomogeneous media; Plasma applications; Plasma measurements; Plasma properties; Superconducting thin films; Voltage; Josephson junction; lumped array; multilayer; voltage standard;
Journal_Title :
Applied Superconductivity, IEEE Transactions on
DOI :
10.1109/TASC.2005.849706