• DocumentCode
    834100
  • Title

    Influence of Operating Parameters on Target Erosion of Rectangular Planar DC Magnetron

  • Author

    Qiu, Qingquan ; Li, Qingfu ; Su, Jingjing ; Jiao, Yu ; Finley, Jim

  • Author_Institution
    Dept. of Electr. Eng., Xi´´an Jiaotong Univ., Xian
  • Volume
    36
  • Issue
    4
  • fYear
    2008
  • Firstpage
    1899
  • Lastpage
    1906
  • Abstract
    The influence of the operating parameters such as magnetic field, cathode voltage, and gas pressure on the target erosion of the rectangular planar dc magnetron is discussed in this paper. Through particle simulation for a prototype rectangular magnetron, with the same shape, stronger magnetic field could make the target erosion much sharper; with the same ratio of the field intensity in the end region to that in the straight region, stronger magnetic field could make the anomalous erosion in the curve-out region severer. Furthermore, higher cathode voltage could not only make the target erosion wider but also make the anomalous erosion weaker. Gas pressure has less influence on the target erosion in the straight region, but higher pressure could make the anomalous erosion severer. Finally, how to improve the magnetic field is discussed. Through shimming ferromagnetic and permanent magnet bars in the race track, not only the target erosion becomes wider but also the anomalous erosion could be reduced.
  • Keywords
    magnetrons; sputter deposition; gas pressure; operating parameters; particle simulation; rectangular planar DC magnetron; target erosion; Bars; Cathodes; Glass; Magnetic fields; Magnetic materials; Permanent magnets; Plasma simulation; Sputtering; Target tracking; Voltage; Erosion; magnetron sputtering; particle simulation; plasma;
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2008.927379
  • Filename
    4599082