Title :
Realization of a good contact between Au and Bi2Sr2CaCu2O8+y for HTS ramp-edge junctions
Author :
Imaizumi, Takuya ; Hayase, Shigeaki ; Uchiyama, Tetsuji ; Iguchi, Ienari
Author_Institution :
Tokyo Inst. of Technol., Japan
fDate :
6/1/2005 12:00:00 AM
Abstract :
The fabrication process of high-TC ramp-edge type junctions with a Bi2Sr2CaCu2O8+y (Bi-2212) base electrode and a conventional superconducting counter electrode (Nb, Pb or Pb-In alloy) was investigated. An Au film was deposited as a layer between Bi-2212 and Nb (or Pb, Pb-In). Most of thin films were prepared by a pulsed laser deposition (PLD) method. By optimizing the annealing condition for the junction fabrication process, the higher TC´s (TC∼80 K) of Bi-2212 thin films were stably available after all processes. Resistivity of Au thin film could be reduced to about 1 μΩcm at 4.2 K by heating the sample at 300-400°C during the in-situ Au deposition. There were difficulties to realize Bi-2212/Au/Nb (Pb or Pb-In) junctions. However, in case of Bi-2212/Au junctions, the junction interface was much improved by an interlayer process. Good homogeneous conductivity found to be kept in the fabricated Bi-2212/Au junctions, which was reproducible.
Keywords :
bismuth compounds; calcium compounds; gold; high-temperature superconductors; pulsed laser deposition; strontium compounds; superconducting junction devices; superconducting thin films; 300 to 400 C; 4.2 K; Au film; Au-Bi2Sr2CaCu2O8+y; HTS ramp edge junctions; annealing; base electrode; conventional superconducting counter electrode; good contact; high temperature superconductors; homogeneous conductivity; junction fabrication process; low-temperature superconductors; pulsed laser deposition; resistivity; Bismuth; Conductivity; Electrodes; Fabrication; Gold; Niobium; Pulsed laser deposition; Sputtering; Strontium; Superconducting epitaxial layers; Fabrication; heterojunctions; high-temperature superconductors; low-temperature superconductors; thin films; tunneling;
Journal_Title :
Applied Superconductivity, IEEE Transactions on
DOI :
10.1109/TASC.2005.849751