Generation of Micro Inductively Coupled Plasma on a Chip

Author

Taghioskoui, Mazdak ; Zaghloul, Mona E. ; Montaser, Akbar

Author_Institution

Dept. of Chem., George Washington Univ., Washington, DC

Volume

36

Issue

4

fYear

2008

Firstpage

1262

Lastpage

1263

Abstract

Inductively coupled plasma (ICP) sources are of great importance for a wide range of applications, including but not limited to micro and nanofabrication, chemical analysis, and plasma processing. Portable and battery-operated instruments can be developed using a miniaturized micro ICP chip considering the low-power and low-voltage requirements of micro ICPs. To the best of authors´ knowledge, this is the first report for generation of a micro ICP on a chip with size of nearly 1 mm using a planar coil with diameter of 800 mum. This chip is capable of producing stable ICPs at the power of 1 W, frequency of 900 MHz, and pressure of 1 torr of helium.

Keywords

helium; plasma sources; He; battery-operated instruments; chemical analysis; frequency 900 MHz; microfabrication; microinductively coupled plasma sources; nanofabrication; planar coil; plasma generation; plasma processing; plasma-on-a-chip; portable instruments; power 1 W; pressure 1 torr; size 800 mum; Chemical analysis; Coils; Frequency; Helium; Instruments; Nanofabrication; Plasma applications; Plasma chemistry; Plasma materials processing; Plasma sources; Micro inductively coupled plasma (ICP); plasma-on-a-chip;

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/TPS.2008.924412

Filename

4599107