DocumentCode :
834462
Title :
Parasitic Emission Suppression in Arrays of Individually Addressable Silicon Microcavity Plasma Devices
Author :
Tchertchian, P.A. ; Spinka, T.M. ; Park, S.-J. ; Eden, J.G.
Author_Institution :
Dept. of Electr. & Comput. Eng., Illinois Univ., Urbana, IL
Volume :
36
Issue :
4
fYear :
2008
Firstpage :
1254
Lastpage :
1255
Abstract :
Full addressability of arrays of Si microcavity plasma devices has been demonstrated by adopting a split top electrode design. Arrays of pyramidal microcavities with emitting apertures of 100 times 100 mum2, a pixel pitch of 200 mum, and sizes as large as 512 times 512 pixels have been fabricated in 250-mum-thick Si(100) wafers. Parasitic capacitance is responsible for weak emission from adjacent microcavities when a single pixel is addressed but the suppression of nearest neighbor fluorescence with the current array design is ~6 dB. Any pixel in the array can be addressed with an rms voltage as low as 240 V when the array is operating in 500 torr of Ne.
Keywords :
capacitance; electrodes; fluorescence; microcavities; plasma devices; silicon; Si; full addressability; nearest neighbor fluorescence suppression; parasitic capacitance; parasitic emission suppression; pressure 500 torr; pyramidal microcavities; silicon microcavity plasma devices; split top electrode design; voltage 240 V; weak emission; Apertures; Dielectric devices; Dielectric substrates; Electrodes; Fluorescence; Microcavities; Optical films; Plasma devices; Silicon; Testing; Arrays; microcavity; microplasma; silicon;
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/TPS.2008.926940
Filename :
4599115
Link To Document :
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