Title :
Simulation and measurements on a 64-kbit hybrid Josephson-CMOS memory
Author :
Liu, Q. ; Van Duzer, T. ; Meng, X. ; Whiteley, S.R. ; Fujiwara, K. ; Tomida, T. ; Tokuda, K. ; Yoshikawa, N.
Author_Institution :
Dept. of EECS & Electron. Res. Lab, Univ. of California, Berkeley, CA, USA
fDate :
6/1/2005 12:00:00 AM
Abstract :
A 64-kbit sub-nanosecond Josephson-CMOS hybrid RAM memory is being developed with hybrid high-speed interface circuits. The hybrid memory is designed and fabricated by using commercially available 0.25 μm and 0.35 μm CMOS processes and the NEC (SRL) 2.5 kA/cm2 and UC Berkeley´s 6.5 kA/cm2 Nb processes for Josephson junctions. In order to simulate the low-temperature CMOS circuits, 4 K CMOS device models are established by extracting from experiments. The measurements made at 4 K include static I-V characteristics, gate capacitances and source and drain capacitances. Details of the modeling are found in a companion paper in this issue. Performance of the high-speed interface circuits is optimized by minimizing the parasitic capacitance loading. Both the functional test and high-speed measurement for the interface circuit will be discussed. The whole structure of the memory, including interface circuit, decoder, memory cell, and Josephson read-out circuit is proposed and fabricated. From simulation, a total access time well below 1 ns is expected. The power for the whole system is about 32 mW at 1 GHz. Plans for further power and access time reduction are described.
Keywords :
CMOS memory circuits; Josephson effect; high-speed integrated circuits; integrated circuit design; random-access storage; superconducting memory circuits; 0.25 micron; 0.35 micron; 1 GHz; 32 mW; 4 K; 4 K CMOS device models; 64 kbit; 64-kbit sub-nanosecond Josephson-CMOS hybrid RAM memory; CMOS processes; Josephson junctions; Josephson read-out circuit; access time reduction; decoder; drain capacitance; functional test; gate capacitances; high-speed measurement; hybrid high-speed interface circuits; hybrid memory; low-temperature CMOS circuits; memory cell; para-sitic capacitance loading minimization; power time reduction; source capacitance; static I-V characteristics; total access time; CMOS memory circuits; CMOS process; Circuit simulation; Circuit testing; National electric code; Niobium; Parasitic capacitance; Random access memory; Read-write memory; Semiconductor device modeling; Access time; hybrid memory; interface circuit; low temperature CMOS;
Journal_Title :
Applied Superconductivity, IEEE Transactions on
DOI :
10.1109/TASC.2005.849863