Title :
Multiblock Concurrent PLS for Decentralized Monitoring of Continuous Annealing Processes
Author :
Qiang Liu ; Qin, S. Jeo ; Tianyou Chai
Author_Institution :
State Key Lab. of Synthetical Autom. for Process Ind. & the Res. Center of Autom., Northeastern Univ., Shenyang, China
Abstract :
In this paper, a data-driven multiblock concurrent projection to latent structures (CPLS) method is proposed for monitoring large-scale manufacturing lines, particularly for cold rolling continuous annealing processes (CAPs) fault diagnosis. The proposed method provides decentralized process monitoring and helps localize faults in both input variables and output variables concurrently. First, the CPLS-based process monitoring method is briefly reviewed. Second, a multiblock CPLS algorithm, which incorporates process block partition, is proposed to diagnose faults relevant to process inputs or outputs with a decentralized structure. For the CAP line application, tension-specific variations, roll-specific variations, and tension-roll covariations are analyzed in each partitioned block. Furthermore, within the roll-specific subspace of an abnormal block, a delay-alignment scheme based on strip transportation delay is proposed to diagnose defective processing materials.
Keywords :
annealing; cold rolling; fault diagnosis; process monitoring; CAP fault diagnosis; cold rolling continuous annealing process; decentralized monitoring; decentralized process monitoring; decentralized structure; delay-alignment scheme; input variables; large-scale manufacturing lines; multiblock CPLS algorithm; multiblock concurrent projection-to-latent structures; output variables; process block partition; roll-specific subspace; roll-specific variations; strip transportation delay; tension-roll covariations; tension-specific variations; Annealing; Correlation; Current measurement; Fault diagnosis; Materials; Monitoring; Principal component analysis; Concurrent projection to latent structures (CPLS); continuous annealing processes (CAPs); decentralized process monitoring; multiblock diagnosis;
Journal_Title :
Industrial Electronics, IEEE Transactions on
DOI :
10.1109/TIE.2014.2303781