Title :
Fabrication of 2-D and 3-D silicon photonic crystals by deep etching
Author :
Chelnokov, Alexei ; David, Sylvain ; Wang, Kang ; Marty, Frederic ; Lourtioz, Jean-Michel
Author_Institution :
Inst. d´´Electronique Fondamentale, CNRS, Orsay, France
Abstract :
Deep etching methods applied to semiconductors allow the fabrication of two-dimensional and three-dimensional photonic crystals. The use of chemical, plasma, and focused ion beam etch applied to silicon is reviewed.
Keywords :
etching; ion beam assisted deposition; optical fabrication; photonic band gap; silicon; sputter etching; 2-D silicon photonic crystal fabrication; 3-D silicon photonic crystals; Si; chemical etching; deep etching; focused ion beam etch; plasma etching; Etching; Fabrication; Interference; Optical losses; Optical refraction; Optical scattering; Optical waveguides; Personal communication networks; Photonic crystals; Silicon;
Journal_Title :
Selected Topics in Quantum Electronics, IEEE Journal of
DOI :
10.1109/JSTQE.2002.801736
