DocumentCode
835577
Title
Fabrication of 2-D and 3-D silicon photonic crystals by deep etching
Author
Chelnokov, Alexei ; David, Sylvain ; Wang, Kang ; Marty, Frederic ; Lourtioz, Jean-Michel
Author_Institution
Inst. d´´Electronique Fondamentale, CNRS, Orsay, France
Volume
8
Issue
4
fYear
2002
Firstpage
919
Lastpage
927
Abstract
Deep etching methods applied to semiconductors allow the fabrication of two-dimensional and three-dimensional photonic crystals. The use of chemical, plasma, and focused ion beam etch applied to silicon is reviewed.
Keywords
etching; ion beam assisted deposition; optical fabrication; photonic band gap; silicon; sputter etching; 2-D silicon photonic crystal fabrication; 3-D silicon photonic crystals; Si; chemical etching; deep etching; focused ion beam etch; plasma etching; Etching; Fabrication; Interference; Optical losses; Optical refraction; Optical scattering; Optical waveguides; Personal communication networks; Photonic crystals; Silicon;
fLanguage
English
Journal_Title
Selected Topics in Quantum Electronics, IEEE Journal of
Publisher
ieee
ISSN
1077-260X
Type
jour
DOI
10.1109/JSTQE.2002.801736
Filename
1039483
Link To Document