Title :
Fabrication of photonic crystals in silicon-on-insulator using 248-nm deep UV lithography
Author :
Bogaerts, Wim ; Wiaux, Vincent ; Taillaert, Dirk ; Beckx, Stephan ; Luyssaert, Bert ; Bienstman, Peter ; Baets, Roel
Author_Institution :
Dept. of Inf. Technol., Ghent Univ., Belgium
Abstract :
We demonstrate wavelength-scale photonic nanostructures, including photonic crystals, fabricated in silicon-on-insulator using deep ultraviolet (UV) lithography. We discuss the mass-manufacturing capabilities of deep UV lithography compared to e-beam lithography. This is illustrated with experimental results. Finally, we present some of the issues that arise when trying to use established complementary metal-oxide-semiconductor processes for the fabrication of photonic integrated circuits.
Keywords :
CMOS integrated circuits; integrated optics; integrated optoelectronics; nanotechnology; optical fabrication; photonic band gap; silicon-on-insulator; ultraviolet lithography; 248 nm; 248-nm deep UV lithography; CMOS circuits; SOI photonic crystal fabrication; complementary metal-oxide-semiconductor processes; deep ultraviolet lithography; mass-manufacturing capabilities; photonic integrated circuits; wavelength-scale photonic nanostructures; III-V semiconductor materials; Lithography; Optical device fabrication; Optical fiber communication; Optical films; Optical refraction; Optical waveguides; Photonic crystals; Photonic integrated circuits; Silicon on insulator technology;
Journal_Title :
Selected Topics in Quantum Electronics, IEEE Journal of
DOI :
10.1109/JSTQE.2002.800845
