Fabrication of photonic crystals in silicon-on-insulator using 248-nm deep UV lithography

Author

Bogaerts, Wim ; Wiaux, Vincent ; Taillaert, Dirk ; Beckx, Stephan ; Luyssaert, Bert ; Bienstman, Peter ; Baets, Roel

Author_Institution

Dept. of Inf. Technol., Ghent Univ., Belgium

Volume

8

Issue

4

fYear

2002

Firstpage

928

Lastpage

934

Abstract

We demonstrate wavelength-scale photonic nanostructures, including photonic crystals, fabricated in silicon-on-insulator using deep ultraviolet (UV) lithography. We discuss the mass-manufacturing capabilities of deep UV lithography compared to e-beam lithography. This is illustrated with experimental results. Finally, we present some of the issues that arise when trying to use established complementary metal-oxide-semiconductor processes for the fabrication of photonic integrated circuits.

Keywords

CMOS integrated circuits; integrated optics; integrated optoelectronics; nanotechnology; optical fabrication; photonic band gap; silicon-on-insulator; ultraviolet lithography; 248 nm; 248-nm deep UV lithography; CMOS circuits; SOI photonic crystal fabrication; complementary metal-oxide-semiconductor processes; deep ultraviolet lithography; mass-manufacturing capabilities; photonic integrated circuits; wavelength-scale photonic nanostructures; III-V semiconductor materials; Lithography; Optical device fabrication; Optical fiber communication; Optical films; Optical refraction; Optical waveguides; Photonic crystals; Photonic integrated circuits; Silicon on insulator technology;

fLanguage

English

Journal_Title

Selected Topics in Quantum Electronics, IEEE Journal of

Publisher

ieee

ISSN

1077-260X

Type

jour

DOI

10.1109/JSTQE.2002.800845

Filename

1039484