DocumentCode :
83591
Title :
Thermal Stability of Silicon Carbide Power JFETs
Author :
Buttay, Cyril ; Ouaida, Remy ; Morel, Herve ; Bergogne, Dominique ; Raynaud, C. ; Morel, Florent
Author_Institution :
Lab. Ampere, Univ. de Lyon, Villeurbanne, France
Volume :
60
Issue :
12
fYear :
2013
fDate :
Dec. 2013
Firstpage :
4191
Lastpage :
4198
Abstract :
Silicon carbide (SiC) JFETs are attractive devices, but they might suffer from thermal instability. An analysis shows that two mechanisms could lead to their failure: the loss of gate control, which can easily be avoided, and a thermal runaway caused by the conduction losses. Destructive experimental tests performed on a dedicated system show that the latter mechanism is more severe than initially expected. A low thermal resistance and gate driver equipped with protections systems are thus required to ensure safe operation of the SiC JFETs.
Keywords :
junction gate field effect transistors; power semiconductor devices; thermal stability; conduction loss; destructive experimental test; gate control; gate driver; low thermal resistance; power JFET; safe operation; thermal runaway; thermal stability; JFETs; Junctions; Logic gates; Resistance; Silicon carbide; Temperature measurement; Vehicles; JFET; silicon carbide (SiC); thermal runaway;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2013.2287714
Filename :
6656909
Link To Document :
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