• DocumentCode
    83591
  • Title

    Thermal Stability of Silicon Carbide Power JFETs

  • Author

    Buttay, Cyril ; Ouaida, Remy ; Morel, Herve ; Bergogne, Dominique ; Raynaud, C. ; Morel, Florent

  • Author_Institution
    Lab. Ampere, Univ. de Lyon, Villeurbanne, France
  • Volume
    60
  • Issue
    12
  • fYear
    2013
  • fDate
    Dec. 2013
  • Firstpage
    4191
  • Lastpage
    4198
  • Abstract
    Silicon carbide (SiC) JFETs are attractive devices, but they might suffer from thermal instability. An analysis shows that two mechanisms could lead to their failure: the loss of gate control, which can easily be avoided, and a thermal runaway caused by the conduction losses. Destructive experimental tests performed on a dedicated system show that the latter mechanism is more severe than initially expected. A low thermal resistance and gate driver equipped with protections systems are thus required to ensure safe operation of the SiC JFETs.
  • Keywords
    junction gate field effect transistors; power semiconductor devices; thermal stability; conduction loss; destructive experimental test; gate control; gate driver; low thermal resistance; power JFET; safe operation; thermal runaway; thermal stability; JFETs; Junctions; Logic gates; Resistance; Silicon carbide; Temperature measurement; Vehicles; JFET; silicon carbide (SiC); thermal runaway;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2013.2287714
  • Filename
    6656909