DocumentCode
835999
Title
Physics and applications of charged particle beam sources
Author
Hamilton, Gordon W. ; Bacal, Marthe
Author_Institution
Lab. du CNRS, Ecole Polytech., Palaiseau, France
Volume
19
Issue
6
fYear
1991
fDate
12/1/1991 12:00:00 AM
Firstpage
1143
Lastpage
1151
Abstract
The authors review the physics and a few applications of charged particle beam sources, most of which originate from, propagate through, or use as a target, a partially ionized plasma. The authors present the plasma phenomena and plasma conditions which are general to most of the charged particle sources, but also other approaches and the current status of the research. The authors describe the applications of charged particle beam sources using partially ionized plasmas in accelerators and ion implantation. The applications covered are those of accelerator sources and ion implantation
Keywords
beam handling techniques; ion sources; particle beam diagnostics; plasma applications; plasma diagnostics; plasma production; reviews; accelerators; charged particle beam sources; ion implantation; partially ionized plasma; plasma conditions; plasma phenomena; review; Ionization; Particle beams; Physics; Plasma accelerators; Plasma applications; Plasma density; Plasma immersion ion implantation; Plasma sources; Plasma temperature; Plasma transport processes;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/27.125037
Filename
125037
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